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Nanofabrication of gallium nitride photonic crystal light-emitting diodes

Nanofabrication of gallium nitride photonic crystal light-emitting diodes
Nanofabrication of gallium nitride photonic crystal light-emitting diodes
We describe a comparison of nanofabrication technologies for the fabrication of 2D photonic crystal structures on GaN/InGaN blue LEDs. Such devices exhibit enhanced brightness and the possibility of controlling the angular emission profile of emitted light. This paper describes three nano lithography techniques for patterning photonic crystal structures on the emitting faces of LEDs: direct-write electron beam lithography, hard stamp nanoimprint lithography and soft-stamp nanoimprint lithography with disposable embossing masters. In each case we describe variations on the technique as well as its advantages and disadvantages. Complete process details have been given for all three techniques. In addition, we show how high performance GaN dry etch techniques, coupled with optical process monitoring can transfer resist patterns into underlying GaN material with high fidelity
0167-9317
Khokhar, Ali Z.
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Parsons, Keith
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Hubbard, Graham
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Rahman, Faiz
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Macintyre, Douglas S
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Xiong, Chang
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Massoubre, David
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Gong, Zheng
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Johnson, Nigel P
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De La Rue, Richard M.
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Watson, Ian M.
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Gu, Erdan
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Dawson, Martin D.
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Abbott, Steve J.
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Charlton, Martin
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Tillin, Martin
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Khokhar, Ali Z.
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Parsons, Keith
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Hubbard, Graham
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Rahman, Faiz
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Macintyre, Douglas S
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Xiong, Chang
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Massoubre, David
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Gong, Zheng
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Johnson, Nigel P
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De La Rue, Richard M.
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Watson, Ian M.
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Gu, Erdan
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Dawson, Martin D.
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Abbott, Steve J.
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Charlton, Martin
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Tillin, Martin
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Khokhar, Ali Z., Parsons, Keith, Hubbard, Graham, Rahman, Faiz, Macintyre, Douglas S, Xiong, Chang, Massoubre, David, Gong, Zheng, Johnson, Nigel P, De La Rue, Richard M., Watson, Ian M., Gu, Erdan, Dawson, Martin D., Abbott, Steve J., Charlton, Martin and Tillin, Martin (2010) Nanofabrication of gallium nitride photonic crystal light-emitting diodes. Microelectronic Engineering.

Record type: Article

Abstract

We describe a comparison of nanofabrication technologies for the fabrication of 2D photonic crystal structures on GaN/InGaN blue LEDs. Such devices exhibit enhanced brightness and the possibility of controlling the angular emission profile of emitted light. This paper describes three nano lithography techniques for patterning photonic crystal structures on the emitting faces of LEDs: direct-write electron beam lithography, hard stamp nanoimprint lithography and soft-stamp nanoimprint lithography with disposable embossing masters. In each case we describe variations on the technique as well as its advantages and disadvantages. Complete process details have been given for all three techniques. In addition, we show how high performance GaN dry etch techniques, coupled with optical process monitoring can transfer resist patterns into underlying GaN material with high fidelity

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Published date: 2010
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 270974
URI: http://eprints.soton.ac.uk/id/eprint/270974
ISSN: 0167-9317
PURE UUID: 04a7e65c-a151-4b14-a45b-c2d2947f7926

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Date deposited: 04 May 2010 10:05
Last modified: 19 Jul 2019 22:14

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Contributors

Author: Ali Z. Khokhar
Author: Keith Parsons
Author: Graham Hubbard
Author: Faiz Rahman
Author: Douglas S Macintyre
Author: Chang Xiong
Author: David Massoubre
Author: Zheng Gong
Author: Nigel P Johnson
Author: Richard M. De La Rue
Author: Ian M. Watson
Author: Erdan Gu
Author: Martin D. Dawson
Author: Steve J. Abbott
Author: Martin Charlton
Author: Martin Tillin

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