Suspended quantum dot fabrication on a heavily-doped silicon nanowire by suppressing unintentional quantum dot formation
Suspended quantum dot fabrication on a heavily-doped silicon nanowire by suppressing unintentional quantum dot formation
44001
Ogi, Jun
4e46ba9f-92b9-438c-8b3e-11f9e00f7d3e
Ghiass, Mohammad Adel
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Tsuchiya, Yoshishige
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Uchida, K
94591838-45bd-426b-91da-f9d60a055c6c
Oda, S
514339b3-f8de-4750-8d20-c520834b2477
Mizuta, Hiroshi
f14d5ffc-751b-472b-8dba-c8518c6840b9
2010
Ogi, Jun
4e46ba9f-92b9-438c-8b3e-11f9e00f7d3e
Ghiass, Mohammad Adel
ddf17d39-621b-44c6-bf39-2fa84e23b492
Tsuchiya, Yoshishige
5a5178c6-b3a9-4e07-b9b2-9a28e49f1dc2
Uchida, K
94591838-45bd-426b-91da-f9d60a055c6c
Oda, S
514339b3-f8de-4750-8d20-c520834b2477
Mizuta, Hiroshi
f14d5ffc-751b-472b-8dba-c8518c6840b9
Ogi, Jun, Ghiass, Mohammad Adel, Tsuchiya, Yoshishige, Uchida, K, Oda, S and Mizuta, Hiroshi
(2010)
Suspended quantum dot fabrication on a heavily-doped silicon nanowire by suppressing unintentional quantum dot formation.
Japanese Journal of Applied Physics, 49, .
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More information
Published date: 2010
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 271017
URI: http://eprints.soton.ac.uk/id/eprint/271017
PURE UUID: b3ffac2b-8b9e-4f66-9de0-8ef2c675ac63
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Date deposited: 06 May 2010 21:28
Last modified: 08 Jan 2022 02:50
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Contributors
Author:
Jun Ogi
Author:
Mohammad Adel Ghiass
Author:
Yoshishige Tsuchiya
Author:
K Uchida
Author:
S Oda
Author:
Hiroshi Mizuta
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