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A comparative study of four thick photoresists for MEMS applications

A comparative study of four thick photoresists for MEMS applications
A comparative study of four thick photoresists for MEMS applications
741-747
Koukharenka, A
cc515dda-7e3a-45d2-a7cd-8fbc616b0593
Kraft, Michael
54927621-738f-4d40-af56-a027f686b59f
Ensell, G
5ed85009-4be4-4850-b95c-fbb367b67d15
Hollinshead, N
5da06002-2497-487f-95bd-5b8fe3329478
Koukharenka, A
cc515dda-7e3a-45d2-a7cd-8fbc616b0593
Kraft, Michael
54927621-738f-4d40-af56-a027f686b59f
Ensell, G
5ed85009-4be4-4850-b95c-fbb367b67d15
Hollinshead, N
5da06002-2497-487f-95bd-5b8fe3329478

Koukharenka, A, Kraft, Michael, Ensell, G and Hollinshead, N (2005) A comparative study of four thick photoresists for MEMS applications. Journal Material Science:Materials in Electronics, 16 (11-12), 741-747.

Record type: Article

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More information

Published date: 2005
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 271047
URI: https://eprints.soton.ac.uk/id/eprint/271047
PURE UUID: 8feb3efc-6d95-47c6-8167-8637941dfe57

Catalogue record

Date deposited: 10 May 2010 13:53
Last modified: 18 Jul 2017 06:47

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