Koukharenko, Elena, Kuleshova, Jekaterina, Fowler, Marcel, Kok, Stephen, Tudor, MJ, Beeby, SP, Nandhakumar, Iris and White, NM (2010) Ion track technology for nanolithography using thick cross-linked PMMA 950 photoresist. Japanese Journal of Applied Physics, 49 (6).
Record type:
Article
This record has no associated files available for download.
More information
Published date: 2010
Organisations:
EEE
Identifiers
Local EPrints ID: 271181
URI: http://eprints.soton.ac.uk/id/eprint/271181
ISSN: 0021-4922
PURE UUID: 1d74a3d1-1e45-46a8-8d1a-49c2bbabd21c
Catalogue record
Date deposited: 26 May 2010 15:20
Last modified: 11 Dec 2021 03:01
Export record
Contributors
Author:
Elena Koukharenko
Author:
Jekaterina Kuleshova
Author:
Marcel Fowler
Author:
Stephen Kok
Author:
MJ Tudor
Author:
SP Beeby
Author:
Iris Nandhakumar
Author:
NM White
Download statistics
Downloads from ePrints over the past year. Other digital versions may also be available to download e.g. from the publisher's website.