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Ion track technology for nanolithography using thick cross-linked PMMA 950 photoresist

Ion track technology for nanolithography using thick cross-linked PMMA 950 photoresist
Ion track technology for nanolithography using thick cross-linked PMMA 950 photoresist
0021-4922
Koukharenko, Elena
b34ae878-2776-4088-8880-5b2bd4f33ec3
Kuleshova, Jekaterina
0ab2d64a-89ff-47e3-b04a-bdade093788d
Fowler, Marcel
6f1b0e31-adca-457a-a20d-9df732de1e6a
Kok, Stephen
f2888963-2192-4daf-8fd4-d602ce3c0d84
Tudor, MJ
46eea408-2246-4aa0-8b44-86169ed601ff
Beeby, SP
ba565001-2812-4300-89f1-fe5a437ecb0d
Nandhakumar, Iris
1434f8c2-78c8-4b67-bce7-9ecce5091b4b
White, NM
c7be4c26-e419-4e5c-9420-09fc02e2ac9c
Koukharenko, Elena
b34ae878-2776-4088-8880-5b2bd4f33ec3
Kuleshova, Jekaterina
0ab2d64a-89ff-47e3-b04a-bdade093788d
Fowler, Marcel
6f1b0e31-adca-457a-a20d-9df732de1e6a
Kok, Stephen
f2888963-2192-4daf-8fd4-d602ce3c0d84
Tudor, MJ
46eea408-2246-4aa0-8b44-86169ed601ff
Beeby, SP
ba565001-2812-4300-89f1-fe5a437ecb0d
Nandhakumar, Iris
1434f8c2-78c8-4b67-bce7-9ecce5091b4b
White, NM
c7be4c26-e419-4e5c-9420-09fc02e2ac9c

Koukharenko, Elena, Kuleshova, Jekaterina, Fowler, Marcel, Kok, Stephen, Tudor, MJ, Beeby, SP, Nandhakumar, Iris and White, NM (2010) Ion track technology for nanolithography using thick cross-linked PMMA 950 photoresist. Japanese Journal of Applied Physics, 49 (6).

Record type: Article

Full text not available from this repository.

More information

Published date: 2010
Organisations: EEE

Identifiers

Local EPrints ID: 271181
URI: https://eprints.soton.ac.uk/id/eprint/271181
ISSN: 0021-4922
PURE UUID: 1d74a3d1-1e45-46a8-8d1a-49c2bbabd21c
ORCID for SP Beeby: ORCID iD orcid.org/0000-0002-0800-1759
ORCID for NM White: ORCID iD orcid.org/0000-0003-1532-6452

Catalogue record

Date deposited: 26 May 2010 15:20
Last modified: 06 Jun 2018 13:12

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