Focused Helium Ion Beam Milling and Deposition
Focused Helium Ion Beam Milling and Deposition
The use of a helium ion microscope with an integrated gas injection system for nanofabrication is explored by demonstrating the milling of fine features into single layered graphene and the controlled deposition of tungsten and platinum wires from gaseous precursors. Using pattern generator software to control the path of the beam, nanoelectronic device designs are transferred directly into graphene. Four point contact designs are also defined on SiO2/Si surfaces with atomic force microscopy used to characterize the resulting depositions. Although further optimization of the processes is required and questions of beam-induced damage to the delicate graphene lattice are yet to be answered, the helium ion microscope shows potential to go beyond what is possible with Ga+ focused ion beam technologies in nanoscale device fabrication.
Helium ion microscope, graphene, gas injection system, nanoelectronics, quantum dot
Boden, S A
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Moktadir, Zakaria
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Bagnall, Darren
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Mizuta, Hiroshi
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Rutt, Harvey
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Boden, S A
83976b65-e90f-42d1-9a01-fe9cfc571bf8
Moktadir, Zakaria
34472668-ffda-4287-8fea-2c4f3bf1e2fa
Bagnall, Darren
5d84abc8-77e5-43f7-97cb-e28533f25ef1
Mizuta, Hiroshi
f14d5ffc-751b-472b-8dba-c8518c6840b9
Rutt, Harvey
e09fa327-0c01-467a-9898-4e7f0cd715fc
Boden, S A, Moktadir, Zakaria, Bagnall, Darren, Mizuta, Hiroshi and Rutt, Harvey
(2010)
Focused Helium Ion Beam Milling and Deposition.
36th International Conference on Micro & Nano Engineering (MNE), Genoa, Italy.
19 - 22 Sep 2010.
(Submitted)
Record type:
Conference or Workshop Item
(Other)
Abstract
The use of a helium ion microscope with an integrated gas injection system for nanofabrication is explored by demonstrating the milling of fine features into single layered graphene and the controlled deposition of tungsten and platinum wires from gaseous precursors. Using pattern generator software to control the path of the beam, nanoelectronic device designs are transferred directly into graphene. Four point contact designs are also defined on SiO2/Si surfaces with atomic force microscopy used to characterize the resulting depositions. Although further optimization of the processes is required and questions of beam-induced damage to the delicate graphene lattice are yet to be answered, the helium ion microscope shows potential to go beyond what is possible with Ga+ focused ion beam technologies in nanoscale device fabrication.
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More information
Submitted date: 19 September 2010
Additional Information:
Event Dates: 19-22 September 2010
Venue - Dates:
36th International Conference on Micro & Nano Engineering (MNE), Genoa, Italy, 2010-09-19 - 2010-09-22
Keywords:
Helium ion microscope, graphene, gas injection system, nanoelectronics, quantum dot
Organisations:
Electronics & Computer Science, Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 271313
URI: http://eprints.soton.ac.uk/id/eprint/271313
PURE UUID: e5eed375-83c3-4db5-83d8-24d57ba111d2
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Date deposited: 28 Jun 2010 11:08
Last modified: 15 Mar 2024 03:21
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Contributors
Author:
S A Boden
Author:
Zakaria Moktadir
Author:
Darren Bagnall
Author:
Hiroshi Mizuta
Author:
Harvey Rutt
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