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Focused Helium Ion Beam Milling and Deposition

Record type: Conference or Workshop Item (Other)

The use of a helium ion microscope with an integrated gas injection system for nanofabrication is explored by demonstrating the milling of fine features into single layered graphene and the controlled deposition of tungsten and platinum wires from gaseous precursors. Using pattern generator software to control the path of the beam, nanoelectronic device designs are transferred directly into graphene. Four point contact designs are also defined on SiO2/Si surfaces with atomic force microscopy used to characterize the resulting depositions. Although further optimization of the processes is required and questions of beam-induced damage to the delicate graphene lattice are yet to be answered, the helium ion microscope shows potential to go beyond what is possible with Ga+ focused ion beam technologies in nanoscale device fabrication.

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Citation

Boden, S A, Moktadir, Zakaria, Bagnall, Darren, Mizuta, Hiroshi and Rutt, Harvey (2010) Focused Helium Ion Beam Milling and Deposition At 36th International Conference on Micro & Nano Engineering (MNE), Italy. 19 - 22 Sep 2010.

More information

Submitted date: 19 September 2010
Additional Information: Event Dates: 19-22 September 2010
Venue - Dates: 36th International Conference on Micro & Nano Engineering (MNE), Italy, 2010-09-19 - 2010-09-22
Keywords: Helium ion microscope, graphene, gas injection system, nanoelectronics, quantum dot
Organisations: Electronics & Computer Science, Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 271313
URI: http://eprints.soton.ac.uk/id/eprint/271313
PURE UUID: e5eed375-83c3-4db5-83d8-24d57ba111d2
ORCID for S A Boden: ORCID iD orcid.org/0000-0002-4232-1828

Catalogue record

Date deposited: 28 Jun 2010 11:08
Last modified: 18 Jul 2017 06:44

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Contributors

Author: S A Boden ORCID iD
Author: Zakaria Moktadir
Author: Darren Bagnall
Author: Hiroshi Mizuta
Author: Harvey Rutt

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