Focused Helium Ion Beam Milling and Deposition


Boden, S A, Moktadir, Zakaria, Bagnall, Darren, Mizuta, Hiroshi and Rutt, Harvey (2010) Focused Helium Ion Beam Milling and Deposition At 36th International Conference on Micro & Nano Engineering (MNE), Italy. 19 - 22 Sep 2010.

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Description/Abstract

The use of a helium ion microscope with an integrated gas injection system for nanofabrication is explored by demonstrating the milling of fine features into single layered graphene and the controlled deposition of tungsten and platinum wires from gaseous precursors. Using pattern generator software to control the path of the beam, nanoelectronic device designs are transferred directly into graphene. Four point contact designs are also defined on SiO2/Si surfaces with atomic force microscopy used to characterize the resulting depositions. Although further optimization of the processes is required and questions of beam-induced damage to the delicate graphene lattice are yet to be answered, the helium ion microscope shows potential to go beyond what is possible with Ga+ focused ion beam technologies in nanoscale device fabrication.

Item Type: Conference or Workshop Item (Other)
Additional Information: Event Dates: 19-22 September 2010
Venue - Dates: 36th International Conference on Micro & Nano Engineering (MNE), Italy, 2010-09-19 - 2010-09-22
Keywords: Helium ion microscope, graphene, gas injection system, nanoelectronics, quantum dot
Organisations: Electronics & Computer Science, Nanoelectronics and Nanotechnology
ePrint ID: 271313
Date :
Date Event
19 September 2010Submitted
Date Deposited: 28 Jun 2010 11:08
Last Modified: 26 Apr 2017 02:28
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/271313

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