Recrystallised Si nanofingers and nanowires for low cost biosensor applications
Recrystallised Si nanofingers and nanowires for low cost biosensor applications
  Recently, Si nanowires and micron-wide nanoribbons are gaining much attention for biosensing because they offer real-time, label-free, high sensitivity sensing. Currently Si nanowires are fabricated using CMOS technology, SOI substrates and e-beam lithography, which give high costs. In this paper we investigate a lower cost alternative using TFT technology and study the lateral crystallization of Si nanoribbons for application in Si biosensors. A comparison is made of the crystallization of a-Si on SiO2 and on air for use in top-gate and surround-gate sensors. The crystallization is assessed using Normarski microscopy, planar and cross-sectional SEM and defect etching. The results show better lateral crystallization for Si-on-Air than Si-on-Oxide. For a 10h anneal at 550°C, the crystallization extended 24µm for Si-on-Air and 11µm for Si-on-SiO2, whilst a 20h anneal at 525°C gives 7.7µm and 4.9µm respectively. Plan-view SEM images also show slightly lower NiSi2 precipitates in Si-on-Air than Si-on-Oxide. Cross-section SEM images show randomly nucleated grains at the bottom of the crystallized layer, with a density of 1.3/µm and 3.2/µm for Si-on-Air and Si-on-Oxide, indicating the suppression of random grain nucleation in Si-on-Air samples. These results promise better electrical performance from crystallized Si-on-Air sensors than Si-on-Oxide sensors.
  
    
      Kai, Sun
      
        b7c648a3-7be8-4613-9d4d-1bf937fb487b
      
     
  
    
      Hakim, M.M.A.
      
        a3ec2cf3-d89c-4ec5-a66f-e718fba3a52d
      
     
  
    
      Ashburn, P.
      
        68cef6b7-205b-47aa-9efb-f1f09f5c1038
      
     
  
  
   
  
  
    
      1 March 2010
    
    
  
  
    
      Kai, Sun
      
        b7c648a3-7be8-4613-9d4d-1bf937fb487b
      
     
  
    
      Hakim, M.M.A.
      
        a3ec2cf3-d89c-4ec5-a66f-e718fba3a52d
      
     
  
    
      Ashburn, P.
      
        68cef6b7-205b-47aa-9efb-f1f09f5c1038
      
     
  
       
    
 
  
    
      
  
  
  
  
    Kai, Sun, Hakim, M.M.A. and Ashburn, P.
  
  
  
  
   
    (2010)
  
  
    
    Recrystallised Si nanofingers and nanowires for low cost biosensor applications.
  
  
  
  
    
    
    
      
        
   
  
    International Symposium on Atom-scale Si Hybrid Nanotechnologies, Southampton, United Kingdom.
   
        
        
        01 - 02  Mar 2010.
      
    
  
  
  
  
  
  
  
  
   
  
    
      Record type:
      Conference or Workshop Item
      (Poster)
      
      
    
   
    
      
        
          Abstract
          Recently, Si nanowires and micron-wide nanoribbons are gaining much attention for biosensing because they offer real-time, label-free, high sensitivity sensing. Currently Si nanowires are fabricated using CMOS technology, SOI substrates and e-beam lithography, which give high costs. In this paper we investigate a lower cost alternative using TFT technology and study the lateral crystallization of Si nanoribbons for application in Si biosensors. A comparison is made of the crystallization of a-Si on SiO2 and on air for use in top-gate and surround-gate sensors. The crystallization is assessed using Normarski microscopy, planar and cross-sectional SEM and defect etching. The results show better lateral crystallization for Si-on-Air than Si-on-Oxide. For a 10h anneal at 550°C, the crystallization extended 24µm for Si-on-Air and 11µm for Si-on-SiO2, whilst a 20h anneal at 525°C gives 7.7µm and 4.9µm respectively. Plan-view SEM images also show slightly lower NiSi2 precipitates in Si-on-Air than Si-on-Oxide. Cross-section SEM images show randomly nucleated grains at the bottom of the crystallized layer, with a density of 1.3/µm and 3.2/µm for Si-on-Air and Si-on-Oxide, indicating the suppression of random grain nucleation in Si-on-Air samples. These results promise better electrical performance from crystallized Si-on-Air sensors than Si-on-Oxide sensors.
        
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      Published date: 1 March 2010
 
    
  
  
    
  
    
  
    
     
        Venue - Dates:
        International Symposium on Atom-scale Si Hybrid Nanotechnologies, Southampton, United Kingdom, 2010-03-01 - 2010-03-02
      
    
  
    
  
    
  
    
  
    
     
        Organisations:
        Nanoelectronics and Nanotechnology
      
    
  
    
  
  
  
    
  
    
  
  
        Identifiers
        Local EPrints ID: 271591
        URI: http://eprints.soton.ac.uk/id/eprint/271591
        
        
        
        
          PURE UUID: f1c9f7d0-b757-4244-a183-6b48ef660362
        
  
    
        
          
            
              
            
          
        
    
        
          
        
    
        
          
            
          
        
    
  
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  Date deposited: 24 Sep 2010 13:16
  Last modified: 15 Jun 2024 01:42
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      Contributors
      
        
      
          
          Author:
          
            
            
              M.M.A. Hakim
            
          
        
      
        
      
      
      
    
  
   
  
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