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Focused helium ion beam milling and deposition

Focused helium ion beam milling and deposition
Focused helium ion beam milling and deposition
The use of a helium ion microscope with an integrated gas injection system for nanofabrication is explored by demonstrating the milling of fine features into single layered graphene and the controlled deposition of tungsten and platinum wires from gaseous precursors. Using pattern generator software to control the path of the beam, nanoelectronic device designs are transferred directly into graphene. Four point contact designs are also defined on SiO2/Si surfaces with atomic force microscopy used to characterize the resulting depositions. Although further optimization of the processes is required and questions of beam-induced damage to the delicate graphene lattice are yet to be answered, the helium ion microscope shows potential to go beyond what is possible with Ga+ focused ion beam technologies in nanoscale device fabrication.
helium ion microscope, gas injection system, beam-induced deposition, graphene, focused ion beam
0167-9317
2452-2455
Boden, Stuart
83976b65-e90f-42d1-9a01-fe9cfc571bf8
Moktadir, Zakaria
34472668-ffda-4287-8fea-2c4f3bf1e2fa
Bagnall, Darren
5d84abc8-77e5-43f7-97cb-e28533f25ef1
Mizuta, Hiroshi
f14d5ffc-751b-472b-8dba-c8518c6840b9
Rutt, Harvey
e09fa327-0c01-467a-9898-4e7f0cd715fc
Boden, Stuart
83976b65-e90f-42d1-9a01-fe9cfc571bf8
Moktadir, Zakaria
34472668-ffda-4287-8fea-2c4f3bf1e2fa
Bagnall, Darren
5d84abc8-77e5-43f7-97cb-e28533f25ef1
Mizuta, Hiroshi
f14d5ffc-751b-472b-8dba-c8518c6840b9
Rutt, Harvey
e09fa327-0c01-467a-9898-4e7f0cd715fc

Boden, Stuart, Moktadir, Zakaria, Bagnall, Darren, Mizuta, Hiroshi and Rutt, Harvey (2011) Focused helium ion beam milling and deposition Microelectronic Engineering, 88, (8), pp. 2452-2455.

Record type: Article

Abstract

The use of a helium ion microscope with an integrated gas injection system for nanofabrication is explored by demonstrating the milling of fine features into single layered graphene and the controlled deposition of tungsten and platinum wires from gaseous precursors. Using pattern generator software to control the path of the beam, nanoelectronic device designs are transferred directly into graphene. Four point contact designs are also defined on SiO2/Si surfaces with atomic force microscopy used to characterize the resulting depositions. Although further optimization of the processes is required and questions of beam-induced damage to the delicate graphene lattice are yet to be answered, the helium ion microscope shows potential to go beyond what is possible with Ga+ focused ion beam technologies in nanoscale device fabrication.

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Submitted date: 24 November 2010
e-pub ahead of print date: 27 November 2010
Published date: August 2011
Keywords: helium ion microscope, gas injection system, beam-induced deposition, graphene, focused ion beam
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 271713
URI: http://eprints.soton.ac.uk/id/eprint/271713
ISSN: 0167-9317
PURE UUID: 78627948-5459-459e-b23f-3baf27612efd
ORCID for Stuart Boden: ORCID iD orcid.org/0000-0002-4232-1828

Catalogue record

Date deposited: 24 Nov 2010 16:03
Last modified: 07 Oct 2017 10:13

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Contributors

Author: Stuart Boden ORCID iD
Author: Zakaria Moktadir
Author: Darren Bagnall
Author: Hiroshi Mizuta
Author: Harvey Rutt

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