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Sensors for chemical detection based on top-down fabricated polycrystalline silicon nanowires

Sensors for chemical detection based on top-down fabricated polycrystalline silicon nanowires
Sensors for chemical detection based on top-down fabricated polycrystalline silicon nanowires
Semiconducting Silicon (Si) nanowires (NWs) have been widely investigated for their potential to function as highly sensitive and selective sensors for both chemical and biological purposes. A key point of this sensing method is to be real-time and label-free. Several interesting sensing assays have been demonstrated such as sensing of ions, proteins, DNA and viruses[1-3]. The available approaches of silicon nanowire fabrication usually use some advanced lithographic techniques i.e., deep-UV, electron-beam or nanoimprint lithography to pattern silicon nanowires on SOI wafers. Recently, spacer nanowires patterned by a conventional anisotropic dry etch were used to form transistors. While this approach has the advantage of CMOS-compatibility, these techniques are extremely expensive and accessible only to large-scale integrated circuit manufacturers. While this approach delivers a cheap route for nanowire definition, nanowire volume control across the wafer remains challenging as the nanowire sidewall region generally receives unwanted etching.
nanowire, biosensor, sensor, polysilicon
Sun, K.
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Hakim, M.M.A.
e584d902-b647-49eb-85bf-15446c06652a
Lombardini, M.
b984c6d8-d31c-44e8-ba36-f004183eee5c
Davies, D.E.
b8f2ce98-6b03-4c73-9619-44878cd9a77b
Roach, P.L.
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de Planque, M.R.R.
a1d33d13-f516-44fb-8d2c-c51d18bc21ba
Ashburn, P.
68cef6b7-205b-47aa-9efb-f1f09f5c1038
Morgan, H.
de00d59f-a5a2-48c4-a99a-1d5dd7854174
Sun, K.
0d89e1b1-78c6-44af-94aa-e9742efe28ad
Hakim, M.M.A.
e584d902-b647-49eb-85bf-15446c06652a
Lombardini, M.
b984c6d8-d31c-44e8-ba36-f004183eee5c
Davies, D.E.
b8f2ce98-6b03-4c73-9619-44878cd9a77b
Roach, P.L.
2515e8a9-9915-43cb-aec1-47c3230b03a5
de Planque, M.R.R.
a1d33d13-f516-44fb-8d2c-c51d18bc21ba
Ashburn, P.
68cef6b7-205b-47aa-9efb-f1f09f5c1038
Morgan, H.
de00d59f-a5a2-48c4-a99a-1d5dd7854174

Sun, K., Hakim, M.M.A., Lombardini, M., Davies, D.E., Roach, P.L., de Planque, M.R.R., Ashburn, P. and Morgan, H. (2010) Sensors for chemical detection based on top-down fabricated polycrystalline silicon nanowires. NanoBioTech 2010, Switzerland. 15 - 17 Nov 2010.

Record type: Conference or Workshop Item (Other)

Abstract

Semiconducting Silicon (Si) nanowires (NWs) have been widely investigated for their potential to function as highly sensitive and selective sensors for both chemical and biological purposes. A key point of this sensing method is to be real-time and label-free. Several interesting sensing assays have been demonstrated such as sensing of ions, proteins, DNA and viruses[1-3]. The available approaches of silicon nanowire fabrication usually use some advanced lithographic techniques i.e., deep-UV, electron-beam or nanoimprint lithography to pattern silicon nanowires on SOI wafers. Recently, spacer nanowires patterned by a conventional anisotropic dry etch were used to form transistors. While this approach has the advantage of CMOS-compatibility, these techniques are extremely expensive and accessible only to large-scale integrated circuit manufacturers. While this approach delivers a cheap route for nanowire definition, nanowire volume control across the wafer remains challenging as the nanowire sidewall region generally receives unwanted etching.

Full text not available from this repository.

More information

Published date: 2010
Additional Information: Event Dates: 15th - 17th November
Venue - Dates: NanoBioTech 2010, Switzerland, 2010-11-15 - 2010-11-17
Keywords: nanowire, biosensor, sensor, polysilicon
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 271775
URI: https://eprints.soton.ac.uk/id/eprint/271775
PURE UUID: d4f4d84e-1254-43ed-a06c-1ed61bd0aac2
ORCID for M.R.R. de Planque: ORCID iD orcid.org/0000-0002-8787-0513
ORCID for H. Morgan: ORCID iD orcid.org/0000-0003-4850-5676

Catalogue record

Date deposited: 13 Dec 2010 17:07
Last modified: 06 Jun 2018 12:45

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