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Realisation of electroplating moulds with different thick photoresists for MEMS applications

Realisation of electroplating moulds with different thick photoresists for MEMS applications
Realisation of electroplating moulds with different thick photoresists for MEMS applications
95-98
Kukharenka, E.
b34ae878-2776-4088-8880-5b2bd4f33ec3
Kraft, M.
54927621-738f-4d40-af56-a027f686b59f
Kukharenka, E.
b34ae878-2776-4088-8880-5b2bd4f33ec3
Kraft, M.
54927621-738f-4d40-af56-a027f686b59f

Kukharenka, E. and Kraft, M. (2002) Realisation of electroplating moulds with different thick photoresists for MEMS applications. Eurosensors XIV Conference, Czech Republic. 15 - 18 Sep 2002. pp. 95-98 .

Record type: Conference or Workshop Item (Poster)

Full text not available from this repository.

More information

Published date: 6 September 2002
Additional Information: Event Dates: September 15-18
Venue - Dates: Eurosensors XIV Conference, Czech Republic, 2002-09-15 - 2002-09-18
Organisations: Nanoelectronics and Nanotechnology, EEE

Identifiers

Local EPrints ID: 271826
URI: http://eprints.soton.ac.uk/id/eprint/271826
PURE UUID: 149a1b20-0df6-4778-bcca-bac0ea74253b

Catalogue record

Date deposited: 22 Dec 2010 11:24
Last modified: 27 Feb 2019 17:31

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