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Influence of the conditions of fabrication on formation of texture Bi2Te3 and Bi0.5Sb1.5Te3 quickly quenched. Former USSR Conference on Amorphous and microcrystalline semiconductors. S.Petersbourg 5-9 July 1998.p.156.

Influence of the conditions of fabrication on formation of texture Bi2Te3 and Bi0.5Sb1.5Te3 quickly quenched. Former USSR Conference on Amorphous and microcrystalline semiconductors. S.Petersbourg 5-9 July 1998.p.156.
Influence of the conditions of fabrication on formation of texture Bi2Te3 and Bi0.5Sb1.5Te3 quickly quenched. Former USSR Conference on Amorphous and microcrystalline semiconductors. S.Petersbourg 5-9 July 1998.p.156.
Koukharenko, E
c8cc1506-9caf-4ff4-8957-e6ed87514e19
Shepelevich, VG
dd4e9735-9e34-4e1b-b07e-e4e8c8217692
Koukharenko, E
c8cc1506-9caf-4ff4-8957-e6ed87514e19
Shepelevich, VG
dd4e9735-9e34-4e1b-b07e-e4e8c8217692

Koukharenko, E and Shepelevich, VG (1998) Influence of the conditions of fabrication on formation of texture Bi2Te3 and Bi0.5Sb1.5Te3 quickly quenched. Former USSR Conference on Amorphous and microcrystalline semiconductors. S.Petersbourg 5-9 July 1998.p.156. Former USSR Conference on Amorphous and microcrystalline semiconductors., S.Petersbourg (Russia). 04 - 08 Jul 1998.

Record type: Conference or Workshop Item (Other)

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More information

Published date: 1998
Additional Information: Event Dates: 5-9 July 1998
Venue - Dates: Former USSR Conference on Amorphous and microcrystalline semiconductors., S.Petersbourg (Russia), 1998-07-04 - 1998-07-08
Organisations: Electronics & Computer Science

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Local EPrints ID: 271833
URI: http://eprints.soton.ac.uk/id/eprint/271833
PURE UUID: 3aa9d522-a07c-44a6-a759-8763ca8c6f24

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Date deposited: 22 Dec 2010 11:45
Last modified: 10 Dec 2021 23:27

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Contributors

Author: E Koukharenko
Author: VG Shepelevich

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