Large area plasma-enhanced chemical vapor deposition of nanocrystalline graphite on insulator for electronic device application


Schmidt, Marek E., Xu, Cigang, Cooke, Mike, Mizuta, Hiroshi and Chong, H.M.H. (2012) Large area plasma-enhanced chemical vapor deposition of nanocrystalline graphite on insulator for electronic device application At Graphene 2012, Belgium. 10 - 13 Apr 2012.

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Description/Abstract

This paper reports on large area plasma-enhanced chemical vapor deposition (PECVD) of nanocrystalline graphite (NCG) on thermally grown SiO2 wafer, quartz and sapphire substrates. Grown films are evaluated using Raman spectroscopy, ellipsometry, scanning electron microscopy (SEM) and atomic force microscopy (AFM). Electrical characterization and optical transmission measurements
indicate promising properties of this material for use as transparent electrodes and for electronic device application. A plasma-based etch process for NCG has been developed.

Item Type: Conference or Workshop Item (Other)
Venue - Dates: Graphene 2012, Belgium, 2012-04-10 - 2012-04-13
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Subjects:
Organisations: Nanoelectronics and Nanotechnology
ePrint ID: 335890
Date :
Date Event
March 2012Submitted
Date Deposited: 14 Mar 2012 11:46
Last Modified: 17 Apr 2017 17:25
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/335890

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