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Large area plasma-enhanced chemical vapor deposition of nanocrystalline graphite on insulator for electronic device application

Large area plasma-enhanced chemical vapor deposition of nanocrystalline graphite on insulator for electronic device application
Large area plasma-enhanced chemical vapor deposition of nanocrystalline graphite on insulator for electronic device application
This paper reports on large area plasma-enhanced chemical vapor deposition (PECVD) of nanocrystalline graphite (NCG) on thermally grown SiO2 wafer, quartz and sapphire substrates. Grown films are evaluated using Raman spectroscopy, ellipsometry, scanning electron microscopy (SEM) and atomic force microscopy (AFM). Electrical characterization and optical transmission measurements
indicate promising properties of this material for use as transparent electrodes and for electronic device application. A plasma-based etch process for NCG has been developed.
Schmidt, Marek E.
e4489af8-f4ff-4e8d-b7d2-8ca34cb51445
Xu, Cigang
2b5793e8-f5f6-45c1-bf47-ef03ece60b4f
Cooke, Mike
d3bc4b50-7ebd-41a2-aca8-44f7e7a3124a
Mizuta, Hiroshi
f14d5ffc-751b-472b-8dba-c8518c6840b9
Chong, H.M.H.
795aa67f-29e5-480f-b1bc-9bd5c0d558e1
Schmidt, Marek E.
e4489af8-f4ff-4e8d-b7d2-8ca34cb51445
Xu, Cigang
2b5793e8-f5f6-45c1-bf47-ef03ece60b4f
Cooke, Mike
d3bc4b50-7ebd-41a2-aca8-44f7e7a3124a
Mizuta, Hiroshi
f14d5ffc-751b-472b-8dba-c8518c6840b9
Chong, H.M.H.
795aa67f-29e5-480f-b1bc-9bd5c0d558e1

Schmidt, Marek E., Xu, Cigang, Cooke, Mike, Mizuta, Hiroshi and Chong, H.M.H. (2012) Large area plasma-enhanced chemical vapor deposition of nanocrystalline graphite on insulator for electronic device application. Graphene 2012, Belgium. 10 - 13 Apr 2012. (Submitted)

Record type: Conference or Workshop Item (Other)

Abstract

This paper reports on large area plasma-enhanced chemical vapor deposition (PECVD) of nanocrystalline graphite (NCG) on thermally grown SiO2 wafer, quartz and sapphire substrates. Grown films are evaluated using Raman spectroscopy, ellipsometry, scanning electron microscopy (SEM) and atomic force microscopy (AFM). Electrical characterization and optical transmission measurements
indicate promising properties of this material for use as transparent electrodes and for electronic device application. A plasma-based etch process for NCG has been developed.

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More information

Submitted date: March 2012
Venue - Dates: Graphene 2012, Belgium, 2012-04-10 - 2012-04-13
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 335890
URI: https://eprints.soton.ac.uk/id/eprint/335890
PURE UUID: 0fc6b9b1-dc2b-4c26-b2ca-43bc03a685ea
ORCID for H.M.H. Chong: ORCID iD orcid.org/0000-0002-7110-5761

Catalogue record

Date deposited: 14 Mar 2012 11:46
Last modified: 06 Jun 2018 12:37

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Contributors

Author: Marek E. Schmidt
Author: Cigang Xu
Author: Mike Cooke
Author: Hiroshi Mizuta
Author: H.M.H. Chong ORCID iD

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