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An Investigation into the Optimum Thickness of Titanium Dioxide thin films synthesized by using atmospheric pressure chemical vapour deposition for use in photocatalytic water oxidation

An Investigation into the Optimum Thickness of Titanium Dioxide thin films synthesized by using atmospheric pressure chemical vapour deposition for use in photocatalytic water oxidation
An Investigation into the Optimum Thickness of Titanium Dioxide thin films synthesized by using atmospheric pressure chemical vapour deposition for use in photocatalytic water oxidation
Twenty eight films of titanium dioxide of varying thickness were synthesised by using atmospheric pressure chemical vapour deposition (CVD) of titanium(IV) chloride and ethyl acetate onto glass and titanium substrates. Fixed reaction conditions at a substrate temperature of 660?°C were used for all depositions, with varying deposition times of 5–60 seconds used to control the thickness of the samples. A sacrificial electron acceptor system composed of alkaline sodium persulfate was used to determine the rate at which these films could photo-oxidise water in the presence of 365?nm light. The results of this work showed that the optimum thickness for CVD films on titanium substrates for the purposes of water oxidation was ?200?nm, and that a platinum coating on the reverse of such samples leads to a five-fold increase in the observed rate of water oxidation
0947-6539
10546-10552
Hyett, Geoffrey
4f292fc9-2198-4b18-99b9-3c74e7dfed8d
Darr, Jawwad A.
e3096708-4001-4347-87ca-5b45060aa63a
Mills, Andrew
bcd46b3e-0219-4b30-87fa-a81ec7928af9
Parkin, Ivan P.
7f95b9c4-1f9d-441c-8d43-ac8ea2554b85
Hyett, Geoffrey
4f292fc9-2198-4b18-99b9-3c74e7dfed8d
Darr, Jawwad A.
e3096708-4001-4347-87ca-5b45060aa63a
Mills, Andrew
bcd46b3e-0219-4b30-87fa-a81ec7928af9
Parkin, Ivan P.
7f95b9c4-1f9d-441c-8d43-ac8ea2554b85

Hyett, Geoffrey, Darr, Jawwad A., Mills, Andrew and Parkin, Ivan P. (2010) An Investigation into the Optimum Thickness of Titanium Dioxide thin films synthesized by using atmospheric pressure chemical vapour deposition for use in photocatalytic water oxidation. Chemistry - A European Journal, 16 (34), 10546-10552. (doi:10.1002/chem.201000260). (PMID:20645333)

Record type: Article

Abstract

Twenty eight films of titanium dioxide of varying thickness were synthesised by using atmospheric pressure chemical vapour deposition (CVD) of titanium(IV) chloride and ethyl acetate onto glass and titanium substrates. Fixed reaction conditions at a substrate temperature of 660?°C were used for all depositions, with varying deposition times of 5–60 seconds used to control the thickness of the samples. A sacrificial electron acceptor system composed of alkaline sodium persulfate was used to determine the rate at which these films could photo-oxidise water in the presence of 365?nm light. The results of this work showed that the optimum thickness for CVD films on titanium substrates for the purposes of water oxidation was ?200?nm, and that a platinum coating on the reverse of such samples leads to a five-fold increase in the observed rate of water oxidation

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e-pub ahead of print date: July 2010
Published date: 10 September 2010
Organisations: Chemistry

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Local EPrints ID: 342652
URI: http://eprints.soton.ac.uk/id/eprint/342652
ISSN: 0947-6539
PURE UUID: c0affd62-6a76-4f87-a01b-d7b7cacd8b18
ORCID for Geoffrey Hyett: ORCID iD orcid.org/0000-0001-9302-9723

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Date deposited: 12 Sep 2012 10:43
Last modified: 29 Oct 2019 01:38

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Author: Geoffrey Hyett ORCID iD
Author: Jawwad A. Darr
Author: Andrew Mills
Author: Ivan P. Parkin

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