Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors
Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors
Deposition techniques that can uniformly and conformally coat deep trenches and very high aspect ratio pores with uniform thickness films are valuable in the synthesis of complex three-dimensionally structured materials. Here it is shown that high pressure chemical vapor deposition can be used to deposit conformal films of II-VI semiconductors such as ZnSe, ZnS, and ZnO into high aspect ratio pores. Microstructured optical fibers serve as tailored templates for the patterning of II-VI semiconductor microwire arrays of these materials with precision and flexibility. In this way, centimeters-long microwires with exterior surfaces that conform well to the nearly atomically smooth silica templates can be fabricated by conformal coating. This process allows for II-VI semiconductors, which cannot be processed into optical fibers with conventional techniques, to be fabricated into step index and microstructured optical fibers.
1647-1654
Sparks, Justin R.
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He, Rongrui
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Healy, Noel
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Chaudhuri, Subhasis
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Fitzgibbons, Thomas C.
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Peacock, Anna C.
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Sazio, Pier J.A.
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Badding, John V.
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5 April 2013
Sparks, Justin R.
68cb6a0c-29ef-4487-8940-557b05b08568
He, Rongrui
d89761c0-6ad3-460b-80a1-154d33763bdb
Healy, Noel
26eec85c-8d12-4f21-a67a-022f8dc2daab
Chaudhuri, Subhasis
d8f81ab4-87bf-4aa5-a7f5-17843df0bbde
Fitzgibbons, Thomas C.
1af82066-4432-4efa-b6e7-ca5a2baa166b
Peacock, Anna C.
685d924c-ef6b-401b-a0bd-acf1f8e758fc
Sazio, Pier J.A.
0d6200b5-9947-469a-8e97-9147da8a7158
Badding, John V.
dd484978-a8b8-4d1f-9b9e-b6b33bde9e7b
Sparks, Justin R., He, Rongrui, Healy, Noel, Chaudhuri, Subhasis, Fitzgibbons, Thomas C., Peacock, Anna C., Sazio, Pier J.A. and Badding, John V.
(2013)
Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors.
Advanced Functional Materials, 23 (13), .
(doi:10.1002/adfm.201202224).
Abstract
Deposition techniques that can uniformly and conformally coat deep trenches and very high aspect ratio pores with uniform thickness films are valuable in the synthesis of complex three-dimensionally structured materials. Here it is shown that high pressure chemical vapor deposition can be used to deposit conformal films of II-VI semiconductors such as ZnSe, ZnS, and ZnO into high aspect ratio pores. Microstructured optical fibers serve as tailored templates for the patterning of II-VI semiconductor microwire arrays of these materials with precision and flexibility. In this way, centimeters-long microwires with exterior surfaces that conform well to the nearly atomically smooth silica templates can be fabricated by conformal coating. This process allows for II-VI semiconductors, which cannot be processed into optical fibers with conventional techniques, to be fabricated into step index and microstructured optical fibers.
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e-pub ahead of print date: 30 October 2012
Published date: 5 April 2013
Organisations:
Optoelectronics Research Centre
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Local EPrints ID: 344918
URI: http://eprints.soton.ac.uk/id/eprint/344918
ISSN: 1616-301X
PURE UUID: 8adf4d5c-4d04-4e60-a1c0-a4f00570047f
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Date deposited: 06 Nov 2012 16:18
Last modified: 15 Mar 2024 03:15
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Contributors
Author:
Justin R. Sparks
Author:
Rongrui He
Author:
Noel Healy
Author:
Subhasis Chaudhuri
Author:
Thomas C. Fitzgibbons
Author:
Anna C. Peacock
Author:
John V. Badding
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