Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors


Sparks, Justin R., He, Rongrui, Healy, Noel, Chaudhuri, Subhasis, Fitzgibbons, Thomas C., Peacock, Anna C., Sazio, Pier J.A. and Badding, John V. (2012) Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors Advanced Functional Materials (doi:10.1002/adfm.201202224).

Download

Full text not available from this repository.

Description/Abstract

Deposition techniques that can uniformly and conformally coat deep trenches and very high aspect ratio pores with uniform thickness films are valuable in the synthesis of complex three-dimensionally structured materials. Here it is shown that high pressure chemical vapor deposition can be used to deposit conformal films of II-VI semiconductors such as ZnSe, ZnS, and ZnO into high aspect ratio pores. Microstructured optical fi bers serve as tailored templates for the patterning of II-VI semiconductor microwire arrays of these materials with precision and flexibility. In this way, centimeters-long microwires with exterior surfaces that conform well to the nearly atomically smooth silica templates can be fabricated by conformal coating. This process allows for II-VI semiconductors, which cannot be processed into optical fibers with conventional techniques, to be fabricated into step index and microstructured optical fibers.

Item Type: Article
Digital Object Identifier (DOI): doi:10.1002/adfm.201202224
ISSNs: 1616-301X (print)
Related URLs:
Subjects: Q Science > QC Physics
T Technology > TK Electrical engineering. Electronics Nuclear engineering
Organisations: Optoelectronics Research Centre
ePrint ID: 344918
Date :
Date Event
October 2012Published
Date Deposited: 06 Nov 2012 16:18
Last Modified: 17 Apr 2017 16:24
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/344918

Actions (login required)

View Item View Item