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Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors

Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors
Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors
Deposition techniques that can uniformly and conformally coat deep trenches and very high aspect ratio pores with uniform thickness films are valuable in the synthesis of complex three-dimensionally structured materials. Here it is shown that high pressure chemical vapor deposition can be used to deposit conformal films of II-VI semiconductors such as ZnSe, ZnS, and ZnO into high aspect ratio pores. Microstructured optical fibers serve as tailored templates for the patterning of II-VI semiconductor microwire arrays of these materials with precision and flexibility. In this way, centimeters-long microwires with exterior surfaces that conform well to the nearly atomically smooth silica templates can be fabricated by conformal coating. This process allows for II-VI semiconductors, which cannot be processed into optical fibers with conventional techniques, to be fabricated into step index and microstructured optical fibers.
1616-301X
Sparks, Justin R.
68cb6a0c-29ef-4487-8940-557b05b08568
He, Rongrui
d89761c0-6ad3-460b-80a1-154d33763bdb
Healy, Noel
26eec85c-8d12-4f21-a67a-022f8dc2daab
Chaudhuri, Subhasis
d8f81ab4-87bf-4aa5-a7f5-17843df0bbde
Fitzgibbons, Thomas C.
1af82066-4432-4efa-b6e7-ca5a2baa166b
Peacock, Anna C.
685d924c-ef6b-401b-a0bd-acf1f8e758fc
Sazio, Pier J.A.
0d6200b5-9947-469a-8e97-9147da8a7158
Badding, John V.
dd484978-a8b8-4d1f-9b9e-b6b33bde9e7b
Sparks, Justin R.
68cb6a0c-29ef-4487-8940-557b05b08568
He, Rongrui
d89761c0-6ad3-460b-80a1-154d33763bdb
Healy, Noel
26eec85c-8d12-4f21-a67a-022f8dc2daab
Chaudhuri, Subhasis
d8f81ab4-87bf-4aa5-a7f5-17843df0bbde
Fitzgibbons, Thomas C.
1af82066-4432-4efa-b6e7-ca5a2baa166b
Peacock, Anna C.
685d924c-ef6b-401b-a0bd-acf1f8e758fc
Sazio, Pier J.A.
0d6200b5-9947-469a-8e97-9147da8a7158
Badding, John V.
dd484978-a8b8-4d1f-9b9e-b6b33bde9e7b

Sparks, Justin R., He, Rongrui, Healy, Noel, Chaudhuri, Subhasis, Fitzgibbons, Thomas C., Peacock, Anna C., Sazio, Pier J.A. and Badding, John V. (2012) Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors. Advanced Functional Materials. (doi:10.1002/adfm.201202224).

Record type: Article

Abstract

Deposition techniques that can uniformly and conformally coat deep trenches and very high aspect ratio pores with uniform thickness films are valuable in the synthesis of complex three-dimensionally structured materials. Here it is shown that high pressure chemical vapor deposition can be used to deposit conformal films of II-VI semiconductors such as ZnSe, ZnS, and ZnO into high aspect ratio pores. Microstructured optical fibers serve as tailored templates for the patterning of II-VI semiconductor microwire arrays of these materials with precision and flexibility. In this way, centimeters-long microwires with exterior surfaces that conform well to the nearly atomically smooth silica templates can be fabricated by conformal coating. This process allows for II-VI semiconductors, which cannot be processed into optical fibers with conventional techniques, to be fabricated into step index and microstructured optical fibers.

Full text not available from this repository.

More information

Published date: October 2012
Organisations: Optoelectronics Research Centre

Identifiers

Local EPrints ID: 344918
URI: https://eprints.soton.ac.uk/id/eprint/344918
ISSN: 1616-301X
PURE UUID: 8adf4d5c-4d04-4e60-a1c0-a4f00570047f
ORCID for Anna C. Peacock: ORCID iD orcid.org/0000-0002-1940-7172
ORCID for Pier J.A. Sazio: ORCID iD orcid.org/0000-0002-6506-9266

Catalogue record

Date deposited: 06 Nov 2012 16:18
Last modified: 13 Jun 2018 00:34

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