A combinatorial approach to phase synthesis and characterisation in atmospheric pressure chemical vapour deposition
A combinatorial approach to phase synthesis and characterisation in atmospheric pressure chemical vapour deposition
A combinatorial approach to synthesis has been successfully applied to a number of areas of chemistry and materials. This approach is always composed of two key stages, firstly the simultaneous synthesis of a large number of compounds, often within a grid of micro-reactors, or across a substrate with a compositional gradient; and secondly an analytical technique that can rapidly investigate a desired property and compare the results for the compositional range.
In this paper we present the results of a combinatorial approach to Atmospheric Pressure Chemical Vapour Deposition. By using a modified reactor with multiple reagent entry points, and introducing reagents into the reactor through these asymmetrically, a compositional gradient across a deposited film can be formed. The technique will be demonstrated with examples of titanium and tungsten oxides. The rapid analytical method used, the second key step in a combinatorial synthesis, is micro-focus X-ray diffraction mapping, and this will also be discussed.
combinatorial, X-ray diffraction, chemical vapour deposition, thin film, titanium dioxide, tungsten oxide
8966-8970
Hyett, Geoffrey
4f292fc9-2198-4b18-99b9-3c74e7dfed8d
Parkin, Ivan P.
7f95b9c4-1f9d-441c-8d43-ac8ea2554b85
25 September 2007
Hyett, Geoffrey
4f292fc9-2198-4b18-99b9-3c74e7dfed8d
Parkin, Ivan P.
7f95b9c4-1f9d-441c-8d43-ac8ea2554b85
Hyett, Geoffrey and Parkin, Ivan P.
(2007)
A combinatorial approach to phase synthesis and characterisation in atmospheric pressure chemical vapour deposition.
[in special issue: Euro CVD 16: 16th European Conference on Chemical Vapor Deposition]
Surface and Coatings Technology, 201 (22-23), .
(doi:10.1016/j.surfcoat.2007.04.058).
Abstract
A combinatorial approach to synthesis has been successfully applied to a number of areas of chemistry and materials. This approach is always composed of two key stages, firstly the simultaneous synthesis of a large number of compounds, often within a grid of micro-reactors, or across a substrate with a compositional gradient; and secondly an analytical technique that can rapidly investigate a desired property and compare the results for the compositional range.
In this paper we present the results of a combinatorial approach to Atmospheric Pressure Chemical Vapour Deposition. By using a modified reactor with multiple reagent entry points, and introducing reagents into the reactor through these asymmetrically, a compositional gradient across a deposited film can be formed. The technique will be demonstrated with examples of titanium and tungsten oxides. The rapid analytical method used, the second key step in a combinatorial synthesis, is micro-focus X-ray diffraction mapping, and this will also be discussed.
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Published date: 25 September 2007
Keywords:
combinatorial, X-ray diffraction, chemical vapour deposition, thin film, titanium dioxide, tungsten oxide
Organisations:
Organic Chemistry: Synthesis, Catalysis and Flow
Identifiers
Local EPrints ID: 346997
URI: http://eprints.soton.ac.uk/id/eprint/346997
ISSN: 0257-8972
PURE UUID: 7ed0ab97-6f2c-4cdb-bc91-a37053638d8d
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Date deposited: 14 Feb 2013 16:42
Last modified: 15 Mar 2024 03:45
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Author:
Ivan P. Parkin
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