The use of cationic surfactants to control the structure of zinc oxide films prepared by chemical vapour deposition
The use of cationic surfactants to control the structure of zinc oxide films prepared by chemical vapour deposition
This paper describes a powerful and versatile new method for controlling the structure of zinc oxide thin films prepared by aerosol assisted chemical vapour deposition, based on the use of a common surfactant. The technique combines the benefits of solution and vapour based methods and leads to high quality morphologically-defined and orientated thin films.
1490-1492
McNally, Ciara S.
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Turner, David P.
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Kulak, Alex N.
1b415d28-256b-44aa-a442-f622e179a336
Meldrum, Fiona C.
74fd7c2e-1c1d-4b09-a6a9-eafbf6450f53
Hyett, Geoffrey
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2012
McNally, Ciara S.
a6fe2301-0f5b-4e71-b726-95d8c0a0b4c9
Turner, David P.
f6aae651-6b9c-4dc6-830a-84450ef9c592
Kulak, Alex N.
1b415d28-256b-44aa-a442-f622e179a336
Meldrum, Fiona C.
74fd7c2e-1c1d-4b09-a6a9-eafbf6450f53
Hyett, Geoffrey
4f292fc9-2198-4b18-99b9-3c74e7dfed8d
McNally, Ciara S., Turner, David P., Kulak, Alex N., Meldrum, Fiona C. and Hyett, Geoffrey
(2012)
The use of cationic surfactants to control the structure of zinc oxide films prepared by chemical vapour deposition.
Chemical Communications, 48 (10), .
(doi:10.1039/c2cc14468a).
Abstract
This paper describes a powerful and versatile new method for controlling the structure of zinc oxide thin films prepared by aerosol assisted chemical vapour deposition, based on the use of a common surfactant. The technique combines the benefits of solution and vapour based methods and leads to high quality morphologically-defined and orientated thin films.
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e-pub ahead of print date: 14 December 2011
Published date: 2012
Organisations:
Organic Chemistry: Synthesis, Catalysis and Flow
Identifiers
Local EPrints ID: 347035
URI: http://eprints.soton.ac.uk/id/eprint/347035
ISSN: 1359-7345
PURE UUID: 49645e26-c506-4308-b9db-1805d6b66b06
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Date deposited: 21 Jan 2013 09:37
Last modified: 15 Mar 2024 03:45
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Contributors
Author:
Ciara S. McNally
Author:
David P. Turner
Author:
Alex N. Kulak
Author:
Fiona C. Meldrum
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