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Reactive dual magnetron sputtering of Ta2O5 and Al2O3: Optical and structural properties and thin film applications

Reactive dual magnetron sputtering of Ta2O5 and Al2O3: Optical and structural properties and thin film applications
Reactive dual magnetron sputtering of Ta2O5 and Al2O3: Optical and structural properties and thin film applications
Pearce, Stuart
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Estandiarijahromi, H.
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Charlton, M.D.B.
fcf86ab0-8f34-411a-b576-4f684e51e274
Pearce, Stuart
1d0ee7c5-8f72-4783-a034-9b2f67de3531
Estandiarijahromi, H.
efe22d70-cce5-49f8-814a-654cc3327ba3
Charlton, M.D.B.
fcf86ab0-8f34-411a-b576-4f684e51e274

Pearce, Stuart, Estandiarijahromi, H. and Charlton, M.D.B. (2012) Reactive dual magnetron sputtering of Ta2O5 and Al2O3: Optical and structural properties and thin film applications. Photonics West 2012, San Francisco, United States. 21 - 26 Jan 2012. (doi:10.1117/12.906884).

Record type: Conference or Workshop Item (Paper)

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Published date: 9 February 2012
Venue - Dates: Photonics West 2012, San Francisco, United States, 2012-01-21 - 2012-01-26
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 350331
URI: https://eprints.soton.ac.uk/id/eprint/350331
PURE UUID: 269ed086-4e43-47c4-8c5f-b48881abe089

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Date deposited: 25 Mar 2013 16:42
Last modified: 16 Jul 2019 21:39

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Contributors

Author: Stuart Pearce
Author: H. Estandiarijahromi
Author: M.D.B. Charlton

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