Surface texturing for Maxwell-Wagner polarisation engineering
Surface texturing for Maxwell-Wagner polarisation engineering
Surface texturing techniques that are applied in laminar structures to extend the supported Maxwell–Wagner polarisation are described. The roughness of the semiconductor surface is increased, resulting in a subdivision of the large Si–SiO2 interfaces to a multitude of small interfaces. Measured results demonstrate that this surface texturing has a direct effect on the relaxation of the Maxwell–Wagner polarisation and, in particular, at the interfacial to atomic polarisation transition.
5-8
Prodromakis, T.
d58c9c10-9d25-4d22-b155-06c8437acfbf
Papavassiliou, C.
5faf408a-ca30-47e5-8283-4a65536f91ff
2009
Prodromakis, T.
d58c9c10-9d25-4d22-b155-06c8437acfbf
Papavassiliou, C.
5faf408a-ca30-47e5-8283-4a65536f91ff
Prodromakis, T. and Papavassiliou, C.
(2009)
Surface texturing for Maxwell-Wagner polarisation engineering.
Micro & Nano Letters, 4 (1), .
(doi:10.1049/mnl:20080049).
Abstract
Surface texturing techniques that are applied in laminar structures to extend the supported Maxwell–Wagner polarisation are described. The roughness of the semiconductor surface is increased, resulting in a subdivision of the large Si–SiO2 interfaces to a multitude of small interfaces. Measured results demonstrate that this surface texturing has a direct effect on the relaxation of the Maxwell–Wagner polarisation and, in particular, at the interfacial to atomic polarisation transition.
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Published date: 2009
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 351545
URI: http://eprints.soton.ac.uk/id/eprint/351545
ISSN: 1750-0443
PURE UUID: 7dd91871-044d-4382-b6ff-6347243dbe03
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Date deposited: 23 Apr 2013 14:31
Last modified: 14 Mar 2024 13:41
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Author:
T. Prodromakis
Author:
C. Papavassiliou
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