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Batch encapsulation technique for CMOS based chemical sensors

Batch encapsulation technique for CMOS based chemical sensors
Batch encapsulation technique for CMOS based chemical sensors
This paper presents a batch encapsulation technique for CMOS based chemical sensors. SU-8 photoresist is employed as the encapsulant while the sensing membrane of the sensor is directly exposed to the solution. This approach is based on standard photolithographic techniques and thus can be used for processing multiple dies containing chemical sensors in a single step.
cmos, su-8 photoresist, chemical sensor, encapsulation
321-324
Prodromakis, T.
d58c9c10-9d25-4d22-b155-06c8437acfbf
Georgiou, P.
3caf7479-7f5a-46ec-8e3c-ef04d0528caf
Constandinou, T.G.
949507c0-75c7-4307-8d5f-8dcce8d7bfc3
Michelakis, K.
ea581b11-2706-421d-88a2-f710075c9e25
Toumazou, C.
52728165-8fe5-4c54-9fad-e9ccc4423dd6
Prodromakis, T.
d58c9c10-9d25-4d22-b155-06c8437acfbf
Georgiou, P.
3caf7479-7f5a-46ec-8e3c-ef04d0528caf
Constandinou, T.G.
949507c0-75c7-4307-8d5f-8dcce8d7bfc3
Michelakis, K.
ea581b11-2706-421d-88a2-f710075c9e25
Toumazou, C.
52728165-8fe5-4c54-9fad-e9ccc4423dd6

Prodromakis, T., Georgiou, P., Constandinou, T.G., Michelakis, K. and Toumazou, C. (2008) Batch encapsulation technique for CMOS based chemical sensors At 2008 IEEE Biomedical Circuits and Systems Conference, United States. 20 - 22 Nov 2008. , pp. 321-324. (doi:10.1109/BIOCAS.2008.4696939).

Record type: Conference or Workshop Item (Other)

Abstract

This paper presents a batch encapsulation technique for CMOS based chemical sensors. SU-8 photoresist is employed as the encapsulant while the sensing membrane of the sensor is directly exposed to the solution. This approach is based on standard photolithographic techniques and thus can be used for processing multiple dies containing chemical sensors in a single step.

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More information

Published date: 22 November 2008
Venue - Dates: 2008 IEEE Biomedical Circuits and Systems Conference, United States, 2008-11-20 - 2008-11-22
Keywords: cmos, su-8 photoresist, chemical sensor, encapsulation
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 351561
URI: http://eprints.soton.ac.uk/id/eprint/351561
PURE UUID: 91405c8f-86fd-4831-b3c4-05b2ec5ad742

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Date deposited: 29 Apr 2013 09:14
Last modified: 18 Jul 2017 04:25

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Contributors

Author: T. Prodromakis
Author: P. Georgiou
Author: T.G. Constandinou
Author: K. Michelakis
Author: C. Toumazou

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