Application of Maxwell-Wagner polarization in delay lines
Application of Maxwell-Wagner polarization in delay lines
The propagation characteristics of metal–insulator–semiconductor (MIS) lines are controlled by the resistivity of the substrate, the operating frequency and the ratio of the semiconductor to insulator layer thicknesses. A strong interfacial polarisation, also known as the Maxwell–Wagner polarisation, is often responsible for the significant slow-down of the propagation velocity of MIS microstrip transmission lines. This phenomenon has been applied in the development of miniature delay lines exhibiting large electrical dimensions. In this paper we review most previously presented designs and we examine the effect of this polarization mechanism under various parameters. Finally, the presented micro-scale delay lines, exhibit comparable slowing factors with our predecessors at the cost of lower attenuation.
slow-wave, maxwell–wagner, interfacial polarisation, high dielectric, mis lines, delay lines
17-24
Prodromakis, T
d58c9c10-9d25-4d22-b155-06c8437acfbf
Papavassiliou, C.
5faf408a-ca30-47e5-8283-4a65536f91ff
Toumazou, C.
52728165-8fe5-4c54-9fad-e9ccc4423dd6
January 2010
Prodromakis, T
d58c9c10-9d25-4d22-b155-06c8437acfbf
Papavassiliou, C.
5faf408a-ca30-47e5-8283-4a65536f91ff
Toumazou, C.
52728165-8fe5-4c54-9fad-e9ccc4423dd6
Prodromakis, T, Papavassiliou, C. and Toumazou, C.
(2010)
Application of Maxwell-Wagner polarization in delay lines.
Microelectronics Journal, 41 (1), .
Abstract
The propagation characteristics of metal–insulator–semiconductor (MIS) lines are controlled by the resistivity of the substrate, the operating frequency and the ratio of the semiconductor to insulator layer thicknesses. A strong interfacial polarisation, also known as the Maxwell–Wagner polarisation, is often responsible for the significant slow-down of the propagation velocity of MIS microstrip transmission lines. This phenomenon has been applied in the development of miniature delay lines exhibiting large electrical dimensions. In this paper we review most previously presented designs and we examine the effect of this polarization mechanism under various parameters. Finally, the presented micro-scale delay lines, exhibit comparable slowing factors with our predecessors at the cost of lower attenuation.
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Published date: January 2010
Keywords:
slow-wave, maxwell–wagner, interfacial polarisation, high dielectric, mis lines, delay lines
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 351564
URI: http://eprints.soton.ac.uk/id/eprint/351564
ISSN: 0026-2692
PURE UUID: 4fac1040-66ad-48a7-bf92-bae2a08f04f2
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Date deposited: 26 Apr 2013 11:43
Last modified: 08 Jan 2022 03:20
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Contributors
Author:
T Prodromakis
Author:
C. Papavassiliou
Author:
C. Toumazou
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