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Application of Maxwell-Wagner polarization in delay lines

Application of Maxwell-Wagner polarization in delay lines
Application of Maxwell-Wagner polarization in delay lines
The propagation characteristics of metal–insulator–semiconductor (MIS) lines are controlled by the resistivity of the substrate, the operating frequency and the ratio of the semiconductor to insulator layer thicknesses. A strong interfacial polarisation, also known as the Maxwell–Wagner polarisation, is often responsible for the significant slow-down of the propagation velocity of MIS microstrip transmission lines. This phenomenon has been applied in the development of miniature delay lines exhibiting large electrical dimensions. In this paper we review most previously presented designs and we examine the effect of this polarization mechanism under various parameters. Finally, the presented micro-scale delay lines, exhibit comparable slowing factors with our predecessors at the cost of lower attenuation.
slow-wave, maxwell–wagner, interfacial polarisation, high dielectric, mis lines, delay lines
0026-2692
17-24
Prodromakis, T
d58c9c10-9d25-4d22-b155-06c8437acfbf
Papavassiliou, C.
5faf408a-ca30-47e5-8283-4a65536f91ff
Toumazou, C.
52728165-8fe5-4c54-9fad-e9ccc4423dd6
Prodromakis, T
d58c9c10-9d25-4d22-b155-06c8437acfbf
Papavassiliou, C.
5faf408a-ca30-47e5-8283-4a65536f91ff
Toumazou, C.
52728165-8fe5-4c54-9fad-e9ccc4423dd6

Prodromakis, T, Papavassiliou, C. and Toumazou, C. (2010) Application of Maxwell-Wagner polarization in delay lines. Microelectronics Journal, 41 (1), 17-24.

Record type: Article

Abstract

The propagation characteristics of metal–insulator–semiconductor (MIS) lines are controlled by the resistivity of the substrate, the operating frequency and the ratio of the semiconductor to insulator layer thicknesses. A strong interfacial polarisation, also known as the Maxwell–Wagner polarisation, is often responsible for the significant slow-down of the propagation velocity of MIS microstrip transmission lines. This phenomenon has been applied in the development of miniature delay lines exhibiting large electrical dimensions. In this paper we review most previously presented designs and we examine the effect of this polarization mechanism under various parameters. Finally, the presented micro-scale delay lines, exhibit comparable slowing factors with our predecessors at the cost of lower attenuation.

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More information

Published date: January 2010
Keywords: slow-wave, maxwell–wagner, interfacial polarisation, high dielectric, mis lines, delay lines
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 351564
URI: https://eprints.soton.ac.uk/id/eprint/351564
ISSN: 0026-2692
PURE UUID: 4fac1040-66ad-48a7-bf92-bae2a08f04f2
ORCID for T Prodromakis: ORCID iD orcid.org/0000-0002-6267-6909

Catalogue record

Date deposited: 26 Apr 2013 11:43
Last modified: 06 Jun 2018 12:24

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Contributors

Author: T Prodromakis ORCID iD
Author: C. Papavassiliou
Author: C. Toumazou

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