Direct helium ion milling technology: towards the fabrication of extremely down-scaled graphene nanodevices
Direct helium ion milling technology: towards the fabrication of extremely down-scaled graphene nanodevices
Hang, Shuojin
81fcaaf8-4887-4c09-ae9d-0771be618f0b
Moktadir, Zakaria
34472668-ffda-4287-8fea-2c4f3bf1e2fa
Kalhor, Nima
510475e4-cb4b-4787-9464-a5768ea5582d
Mizuta, Hiroshi
f14d5ffc-751b-472b-8dba-c8518c6840b9
2013
Hang, Shuojin
81fcaaf8-4887-4c09-ae9d-0771be618f0b
Moktadir, Zakaria
34472668-ffda-4287-8fea-2c4f3bf1e2fa
Kalhor, Nima
510475e4-cb4b-4787-9464-a5768ea5582d
Mizuta, Hiroshi
f14d5ffc-751b-472b-8dba-c8518c6840b9
Hang, Shuojin, Moktadir, Zakaria, Kalhor, Nima and Mizuta, Hiroshi
(2013)
Direct helium ion milling technology: towards the fabrication of extremely down-scaled graphene nanodevices.
The 2013 Silicon Nanoelectronics Workshop (SNW), Kyoto, Japan.
Record type:
Conference or Workshop Item
(Other)
Text
SNW 2013 Shuojin final.pdf
- Other
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Published date: 2013
Venue - Dates:
The 2013 Silicon Nanoelectronics Workshop (SNW), Kyoto, Japan, 2013-01-01
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 352172
URI: http://eprints.soton.ac.uk/id/eprint/352172
PURE UUID: 4336009d-b895-42a5-bd22-d80cdbba67c4
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Date deposited: 03 May 2013 14:06
Last modified: 14 Mar 2024 13:48
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Contributors
Author:
Shuojin Hang
Author:
Zakaria Moktadir
Author:
Nima Kalhor
Author:
Hiroshi Mizuta
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