Kiang, Kian Shen, Kalsi, Sumit, Ritter, Daniel, Unal, Nezih, Morgan, Hywel, Anteney, Iain, Chong, Harold M. H. and de Planque, Maurits R.R. (2013) Fabrication of tapered edgewall apertures using grayscale lithography. 39th International Conference on Micro and Nano Engineering, , London, United Kingdom. 16 - 19 Sep 2013.
Record type:
Conference or Workshop Item
(Poster)
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e-pub ahead of print date: 18 September 2013
Venue - Dates:
39th International Conference on Micro and Nano Engineering, , London, United Kingdom, 2013-09-16 - 2013-09-19
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 354186
URI: http://eprints.soton.ac.uk/id/eprint/354186
PURE UUID: 242e38f9-a3cf-44b9-950d-38b822c6d0e4
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Date deposited: 10 Jul 2013 15:11
Last modified: 11 Dec 2021 04:18
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Contributors
Author:
Kian Shen Kiang
Author:
Sumit Kalsi
Author:
Daniel Ritter
Author:
Nezih Unal
Author:
Hywel Morgan
Author:
Iain Anteney
Author:
Harold M. H. Chong
Author:
Maurits R.R. de Planque
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