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High density patterns fabricated in SU-8 by UV curing nanoimprint

High density patterns fabricated in SU-8 by UV curing nanoimprint
High density patterns fabricated in SU-8 by UV curing nanoimprint
We present results on the nanofabrication of high density patterns in SU-8 resist, based on nanoimprinting combined with UV curing. The temperature dependence of the imprinted depth was investigated. The SU-8 gratings were well resolved with high density, good uniformity and high aspect ratio. This was achieved at low temperature and low pressure. Some issues and possible solutions are discussed. The process should find broader applications such as in the manufacture of nanofluidic channels and nanophotonic structures.
0167-9317
872-876
Wang, Xudi
faa9f647-4739-47fe-bd46-1be44cc47104
Chen, Yifang
fb868aa4-ecb4-4203-a0a8-88c2195a2bae
Banu, Shahanara
5e1caab9-665e-4a17-b582-28a059acdf06
Morgan, Hywel
de00d59f-a5a2-48c4-a99a-1d5dd7854174
Fu, Shaojun
7c4dc5b0-3fe6-4866-992b-7e90b0d1ea35
Cui, Zheng
b0127743-2b0d-4fd7-a383-fa6ed3ccff59
Wang, Xudi
faa9f647-4739-47fe-bd46-1be44cc47104
Chen, Yifang
fb868aa4-ecb4-4203-a0a8-88c2195a2bae
Banu, Shahanara
5e1caab9-665e-4a17-b582-28a059acdf06
Morgan, Hywel
de00d59f-a5a2-48c4-a99a-1d5dd7854174
Fu, Shaojun
7c4dc5b0-3fe6-4866-992b-7e90b0d1ea35
Cui, Zheng
b0127743-2b0d-4fd7-a383-fa6ed3ccff59

Wang, Xudi, Chen, Yifang, Banu, Shahanara, Morgan, Hywel, Fu, Shaojun and Cui, Zheng (2007) High density patterns fabricated in SU-8 by UV curing nanoimprint. [in special issue: Proceedings of the 32nd International Conference on Micro- and Nano-Engineering] Microelectronic Engineering, 84 (5-8), 872-876. (doi:10.1016/j.mee.2007.01.027).

Record type: Article

Abstract

We present results on the nanofabrication of high density patterns in SU-8 resist, based on nanoimprinting combined with UV curing. The temperature dependence of the imprinted depth was investigated. The SU-8 gratings were well resolved with high density, good uniformity and high aspect ratio. This was achieved at low temperature and low pressure. Some issues and possible solutions are discussed. The process should find broader applications such as in the manufacture of nanofluidic channels and nanophotonic structures.

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More information

Accepted/In Press date: 27 January 2007
Published date: May 2007
Organisations: Electronics & Computer Science

Identifiers

Local EPrints ID: 355501
URI: https://eprints.soton.ac.uk/id/eprint/355501
ISSN: 0167-9317
PURE UUID: 50e26f0e-4948-4bbb-8069-d78f3bc4ca84
ORCID for Hywel Morgan: ORCID iD orcid.org/0000-0003-4850-5676

Catalogue record

Date deposited: 21 Oct 2013 11:26
Last modified: 20 Jul 2019 00:59

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