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Femtosecond versus picosecond laser machining of nano-gratings and micro-channels in silica glass

Femtosecond versus picosecond laser machining of nano-gratings and micro-channels in silica glass
Femtosecond versus picosecond laser machining of nano-gratings and micro-channels in silica glass
The ability of 8 picosecond pulse lasers for three dimensional direct-writing in the bulk of transparent dielectrics is assessed through a comparative study with a femtosecond laser delivering 600 fs pulses. The comparison addresses two main applications: the fabrication of birefringent optical elements and two-step machining by laser exposure and post-processing by chemical etching. Formation of self-organized nano-gratings in glass by ps-pulses is demonstrated. Differential etching between ps-laser exposed regions and unexposed silica is observed. Despite attaining values of retardance (>100 nm) and etching rate (2 µm/min) similar to fs pulses, ps pulses are found unsuitable for bulk machining in silica glass primarily due to the build-up of a stress field causing scattering, cracks and non-homogeneous etching. Additionally, we show that the so-called “quill-effect”, that is the dependence of the laser damage from the direction of writing, occurs also for ps-pulse laser machining. Finally, an opposite dependence of the retardance from the intra-pulse distance is observed for fs- and ps-laser direct writing.
1094-4087
3946-3958
Corbari, Costantino
273904e8-5f90-4110-bc17-3d3f2c27d461
Champion, Audrey
9fec2056-0d5f-4c51-b402-732ffc8204c6
Gecevičius, Mindaugas
271576ee-dd9d-40b3-ab2f-19686b91dc64
Beresna, Martynas
a6dc062e-93c6-46a5-aeb3-8de332cdec7b
Bellouard, Yves
50467062-29d4-4f06-a65c-7ef44d183550
Kazansky, Peter G.
a5d123ec-8ea8-408c-8963-4a6d921fd76c
Corbari, Costantino
273904e8-5f90-4110-bc17-3d3f2c27d461
Champion, Audrey
9fec2056-0d5f-4c51-b402-732ffc8204c6
Gecevičius, Mindaugas
271576ee-dd9d-40b3-ab2f-19686b91dc64
Beresna, Martynas
a6dc062e-93c6-46a5-aeb3-8de332cdec7b
Bellouard, Yves
50467062-29d4-4f06-a65c-7ef44d183550
Kazansky, Peter G.
a5d123ec-8ea8-408c-8963-4a6d921fd76c

Corbari, Costantino, Champion, Audrey, Gecevičius, Mindaugas, Beresna, Martynas, Bellouard, Yves and Kazansky, Peter G. (2013) Femtosecond versus picosecond laser machining of nano-gratings and micro-channels in silica glass. Optics Express, 21 (4), 3946-3958. (doi:10.1364/OE.21.003946).

Record type: Article

Abstract

The ability of 8 picosecond pulse lasers for three dimensional direct-writing in the bulk of transparent dielectrics is assessed through a comparative study with a femtosecond laser delivering 600 fs pulses. The comparison addresses two main applications: the fabrication of birefringent optical elements and two-step machining by laser exposure and post-processing by chemical etching. Formation of self-organized nano-gratings in glass by ps-pulses is demonstrated. Differential etching between ps-laser exposed regions and unexposed silica is observed. Despite attaining values of retardance (>100 nm) and etching rate (2 µm/min) similar to fs pulses, ps pulses are found unsuitable for bulk machining in silica glass primarily due to the build-up of a stress field causing scattering, cracks and non-homogeneous etching. Additionally, we show that the so-called “quill-effect”, that is the dependence of the laser damage from the direction of writing, occurs also for ps-pulse laser machining. Finally, an opposite dependence of the retardance from the intra-pulse distance is observed for fs- and ps-laser direct writing.

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Published date: 2013
Organisations: Optoelectronics Research Centre

Identifiers

Local EPrints ID: 355899
URI: http://eprints.soton.ac.uk/id/eprint/355899
ISSN: 1094-4087
PURE UUID: b8831a22-7926-4f77-80ec-b37b31d613cd

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Date deposited: 09 Sep 2013 12:56
Last modified: 16 Jul 2019 21:25

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Contributors

Author: Costantino Corbari
Author: Audrey Champion
Author: Mindaugas Gecevičius
Author: Yves Bellouard

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