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A novel 3D nanolens for sub-wavelength focusing by self-aligned nanolithography

A novel 3D nanolens for sub-wavelength focusing by self-aligned nanolithography
A novel 3D nanolens for sub-wavelength focusing by self-aligned nanolithography
In this work, a novel type of nanolens based on super oscillation theory has been developed and fabricated. A self-aligned nanolithography process is developed to achieve error-free structured nanolens without the need of complex registration which always carries intrinsic errors. This fabrication technique significantly simplifies the process and reduces the production costs consequently. The success of this process will enable us to achieve focusing and imagining beyond diffraction limit, which will be presented in other communications.
0167-9317
1506-1508
Lu, Bing-Rui
cf8db638-f255-4531-91d3-6c53de353961
Chen, Yifang
fb868aa4-ecb4-4203-a0a8-88c2195a2bae
Wang, Shao-Wei
8e963321-1ac8-4155-b081-fb6fb3c3a5b2
Huq, Ejaz
6ba52b03-395d-4361-96b0-5f0d9d7eb746
Rogers, Edward T.F.
b92cc8ab-0d91-4b2e-b5c7-8a2f490a36a2
Kao, Tsung Sheng
e7777107-c572-4833-af5b-112d7981856e
Qu, Xin-Ping
8572bfee-79e1-4c9c-b178-02ef720b0b33
Liu, Ran
4ea42073-d449-4d6d-abed-86fbb66842e5
Zheludev, Nikolay I.
32fb6af7-97e4-4d11-bca6-805745e40cc6
Lu, Bing-Rui
cf8db638-f255-4531-91d3-6c53de353961
Chen, Yifang
fb868aa4-ecb4-4203-a0a8-88c2195a2bae
Wang, Shao-Wei
8e963321-1ac8-4155-b081-fb6fb3c3a5b2
Huq, Ejaz
6ba52b03-395d-4361-96b0-5f0d9d7eb746
Rogers, Edward T.F.
b92cc8ab-0d91-4b2e-b5c7-8a2f490a36a2
Kao, Tsung Sheng
e7777107-c572-4833-af5b-112d7981856e
Qu, Xin-Ping
8572bfee-79e1-4c9c-b178-02ef720b0b33
Liu, Ran
4ea42073-d449-4d6d-abed-86fbb66842e5
Zheludev, Nikolay I.
32fb6af7-97e4-4d11-bca6-805745e40cc6

Lu, Bing-Rui, Chen, Yifang, Wang, Shao-Wei, Huq, Ejaz, Rogers, Edward T.F., Kao, Tsung Sheng, Qu, Xin-Ping, Liu, Ran and Zheludev, Nikolay I. (2010) A novel 3D nanolens for sub-wavelength focusing by self-aligned nanolithography. Microelectronic Engineering, 87 (5-8), 1506-1508. (doi:10.1016/j.mee.2009.11.064).

Record type: Article

Abstract

In this work, a novel type of nanolens based on super oscillation theory has been developed and fabricated. A self-aligned nanolithography process is developed to achieve error-free structured nanolens without the need of complex registration which always carries intrinsic errors. This fabrication technique significantly simplifies the process and reduces the production costs consequently. The success of this process will enable us to achieve focusing and imagining beyond diffraction limit, which will be presented in other communications.

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More information

Published date: 2010
Organisations: Optoelectronics Research Centre

Identifiers

Local EPrints ID: 356331
URI: https://eprints.soton.ac.uk/id/eprint/356331
ISSN: 0167-9317
PURE UUID: e7fc2135-9a56-45c9-ad34-b34aa96710c2
ORCID for Nikolay I. Zheludev: ORCID iD orcid.org/0000-0002-1013-6636

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Date deposited: 16 Sep 2013 11:24
Last modified: 10 Oct 2019 00:39

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Contributors

Author: Bing-Rui Lu
Author: Yifang Chen
Author: Shao-Wei Wang
Author: Ejaz Huq
Author: Edward T.F. Rogers
Author: Tsung Sheng Kao
Author: Xin-Ping Qu
Author: Ran Liu

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