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Ultra-wide detuning planar Bragg grating fabrication technique based on direct UV grating writing with electro-optic phase modulation

Ultra-wide detuning planar Bragg grating fabrication technique based on direct UV grating writing with electro-optic phase modulation
Ultra-wide detuning planar Bragg grating fabrication technique based on direct UV grating writing with electro-optic phase modulation
A direct UV grating writing technique based on phase-controlled interferometry is proposed and demonstrated in a silica-on-silicon platform, with a wider wavelength detuning range than any previously reported UV writing technology. Electro-optic phase modulation of one beam in the interferometer is used to manipulate the fringe pattern and thus control the parameters of the Bragg gratings and waveguides. Various grating structures with refractive index apodization, phase shifts and index contrasts of up to 0.8×10-3 have been demonstrated. The method offers significant time/energy efficiency as well as simplified optical layout and fabrication process. We have shown Bragg gratings can be made from 1200 nm to 1900 nm exclusively under software control and the maximum peak grating reflectivity only decreases by 3dB over a 250 nm (~32THz) bandwidth.
1094-4087
15747-15754
Sima, C.
5d4e6b29-c400-4881-952e-63d0768aee6f
Gates, J.C.
b71e31a1-8caa-477e-8556-b64f6cae0dc2
Rogers, H.
c6b6aa89-b14c-48b6-92c0-dd5c5bca683c
Mennea, P.
d994ba05-bcc1-4be3-8ba1-439fb1535a3f
Holmes, C.
16306bb8-8a46-4fd7-bb19-a146758e5263
Zervas, M.N.
1840a474-dd50-4a55-ab74-6f086aa3f701
Smith, P.G.R.
8979668a-8b7a-4838-9a74-1a7cfc6665f6
Sima, C.
5d4e6b29-c400-4881-952e-63d0768aee6f
Gates, J.C.
b71e31a1-8caa-477e-8556-b64f6cae0dc2
Rogers, H.
c6b6aa89-b14c-48b6-92c0-dd5c5bca683c
Mennea, P.
d994ba05-bcc1-4be3-8ba1-439fb1535a3f
Holmes, C.
16306bb8-8a46-4fd7-bb19-a146758e5263
Zervas, M.N.
1840a474-dd50-4a55-ab74-6f086aa3f701
Smith, P.G.R.
8979668a-8b7a-4838-9a74-1a7cfc6665f6

Sima, C., Gates, J.C., Rogers, H., Mennea, P., Holmes, C., Zervas, M.N. and Smith, P.G.R. (2013) Ultra-wide detuning planar Bragg grating fabrication technique based on direct UV grating writing with electro-optic phase modulation. Optics Express, 21 (13), 15747-15754. (doi:10.1364/OE.21.015747).

Record type: Article

Abstract

A direct UV grating writing technique based on phase-controlled interferometry is proposed and demonstrated in a silica-on-silicon platform, with a wider wavelength detuning range than any previously reported UV writing technology. Electro-optic phase modulation of one beam in the interferometer is used to manipulate the fringe pattern and thus control the parameters of the Bragg gratings and waveguides. Various grating structures with refractive index apodization, phase shifts and index contrasts of up to 0.8×10-3 have been demonstrated. The method offers significant time/energy efficiency as well as simplified optical layout and fabrication process. We have shown Bragg gratings can be made from 1200 nm to 1900 nm exclusively under software control and the maximum peak grating reflectivity only decreases by 3dB over a 250 nm (~32THz) bandwidth.

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e-pub ahead of print date: 13 June 2013
Published date: 1 July 2013
Organisations: Optoelectronics Research Centre

Identifiers

Local EPrints ID: 356366
URI: https://eprints.soton.ac.uk/id/eprint/356366
ISSN: 1094-4087
PURE UUID: 9531993c-8603-4f68-9375-2308030d8a43
ORCID for J.C. Gates: ORCID iD orcid.org/0000-0001-8671-5987
ORCID for M.N. Zervas: ORCID iD orcid.org/0000-0002-0651-4059

Catalogue record

Date deposited: 13 Sep 2013 10:44
Last modified: 29 Aug 2019 00:54

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