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Sub-micron optical waveguides for silicon photonics formed via the local oxidation of silicon (LOCOS)

Sub-micron optical waveguides for silicon photonics formed via the local oxidation of silicon (LOCOS)
Sub-micron optical waveguides for silicon photonics formed via the local oxidation of silicon (LOCOS)
In this paper we report a novel fabrication technique for silicon photonic waveguides with sub-micron dimensions. The technique is based upon the Local Oxidation of Silicon (LOCOS) process widely utilised in the fabrication of microelectronics components. This approach enables waveguides to be fabricated with oxide sidewalls with minimal roughness at the silicon/SiO2 interface. It is also sufficiently flexible to enable the depth of the oxidised sidewall to be varied to control the polarisation performance of the waveguides.

We will present preliminary results on submicron waveguide fabrication and loss characteristics (less than 1 dB/cm), as well as effects of varying waveguide width on modal properties of the waveguides. We consider the ease of fabrication, as well as the quality of the devices produced in preliminary experimental fabrication results, and compare the approach to the more conventional requirements of high resolution photolithographically produced waveguides. We also discuss preliminary optical results, as measured by conventional means. Issues such as the origins of loss are discussed in general terms, as are the fabrication characteristics such as waveguide wall roughness and waveguide profile. We will discuss further work that will help to establish the potential of the technique for future applications.
p
Gardes, F.Y.
7a49fc6d-dade-4099-b016-c60737cb5bb2
Reed, G.T.
ca08dd60-c072-4d7d-b254-75714d570139
Knights, A.P.
b39f64ce-2982-4e37-a6d5-dae67bfff73b
Mashanovich, G.
c806e262-af80-4836-b96f-319425060051
Jessop, P.E.
6320e0d8-b5c7-41c4-ae99-82cccd34c931
Rowe, L.
665132c2-7ac8-4445-a8fd-a86cfcc646bc
McFaul, S.
96e6ea50-7228-4dd3-853c-3cfd10391289
Bruce, D.
32986c0d-9909-4c2a-9ea2-daa394033386
Tarr, N.G.
3aec4244-365f-4c30-ac71-1e1de5dfd019
Gardes, F.Y.
7a49fc6d-dade-4099-b016-c60737cb5bb2
Reed, G.T.
ca08dd60-c072-4d7d-b254-75714d570139
Knights, A.P.
b39f64ce-2982-4e37-a6d5-dae67bfff73b
Mashanovich, G.
c806e262-af80-4836-b96f-319425060051
Jessop, P.E.
6320e0d8-b5c7-41c4-ae99-82cccd34c931
Rowe, L.
665132c2-7ac8-4445-a8fd-a86cfcc646bc
McFaul, S.
96e6ea50-7228-4dd3-853c-3cfd10391289
Bruce, D.
32986c0d-9909-4c2a-9ea2-daa394033386
Tarr, N.G.
3aec4244-365f-4c30-ac71-1e1de5dfd019

Gardes, F.Y., Reed, G.T., Knights, A.P., Mashanovich, G., Jessop, P.E., Rowe, L., McFaul, S., Bruce, D. and Tarr, N.G. (2008) Sub-micron optical waveguides for silicon photonics formed via the local oxidation of silicon (LOCOS). Integrated Optoelectronic Devices 2008, San Jose, Cal.. 19 - 24 Jan 2008. p . (doi:10.1117/12.765383).

Record type: Conference or Workshop Item (Paper)

Abstract

In this paper we report a novel fabrication technique for silicon photonic waveguides with sub-micron dimensions. The technique is based upon the Local Oxidation of Silicon (LOCOS) process widely utilised in the fabrication of microelectronics components. This approach enables waveguides to be fabricated with oxide sidewalls with minimal roughness at the silicon/SiO2 interface. It is also sufficiently flexible to enable the depth of the oxidised sidewall to be varied to control the polarisation performance of the waveguides.

We will present preliminary results on submicron waveguide fabrication and loss characteristics (less than 1 dB/cm), as well as effects of varying waveguide width on modal properties of the waveguides. We consider the ease of fabrication, as well as the quality of the devices produced in preliminary experimental fabrication results, and compare the approach to the more conventional requirements of high resolution photolithographically produced waveguides. We also discuss preliminary optical results, as measured by conventional means. Issues such as the origins of loss are discussed in general terms, as are the fabrication characteristics such as waveguide wall roughness and waveguide profile. We will discuss further work that will help to establish the potential of the technique for future applications.

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More information

Published date: February 2008
Venue - Dates: Integrated Optoelectronic Devices 2008, San Jose, Cal., 2008-01-19 - 2008-01-24
Organisations: Optoelectronics Research Centre, Photonic Systems Circuits & Sensors

Identifiers

Local EPrints ID: 356476
URI: https://eprints.soton.ac.uk/id/eprint/356476
PURE UUID: 65622efc-1e5e-49a4-aea1-63d05be1040f

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Date deposited: 16 Sep 2013 13:39
Last modified: 18 Oct 2018 16:32

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Contributors

Author: F.Y. Gardes
Author: G.T. Reed
Author: A.P. Knights
Author: G. Mashanovich
Author: P.E. Jessop
Author: L. Rowe
Author: S. McFaul
Author: D. Bruce
Author: N.G. Tarr

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