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Free carrier lifetime modification for silicon waveguide based devices

Free carrier lifetime modification for silicon waveguide based devices
Free carrier lifetime modification for silicon waveguide based devices
We investigate the effect of silicon ion irradiation on free carrier lifetime in silicon waveguides, and thus its ability to reduce the density of two-photon-absorption (TPA) generated free carriers. Our experimental results show that free carrier lifetime can be reduced significantly by silicon ion implantation. Associated excess optical absorption from the implanted ions can be reduced to an acceptable level if irradiation energy and dose are correctly chosen. Simulations of Raman scattering suggest that net gain can be achieved in certain cases without the need for an integrated diode in reverse bias to remove the photo-generated free carriers.
1094-4087
19779-19784
Wright, N.M.
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Thomson, D.J.
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Litvinenko, K.L.
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Headley, W.R.
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Smith, A.J.
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Knights, A.P.
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Deane, J.H.B.
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Gardes, F.Y.
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Mashanovich, G.Z.
c806e262-af80-4836-b96f-319425060051
Gwilliam, R.
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Reed, G.T.
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Wright, N.M.
df44aecb-6c0d-4090-af8d-cb8518bb081e
Thomson, D.J.
17c1626c-2422-42c6-98e0-586ae220bcda
Litvinenko, K.L.
311d7f0a-ad5c-43fc-9f5a-093e135cdac3
Headley, W.R.
5a80c998-1fc3-4ad0-a82a-3870250efbd8
Smith, A.J.
ff8197a7-2583-4dae-a9d2-ad9d73a2f937
Knights, A.P.
b39f64ce-2982-4e37-a6d5-dae67bfff73b
Deane, J.H.B.
346663e3-b124-46e0-bbe3-2f7911f3d5a2
Gardes, F.Y.
7a49fc6d-dade-4099-b016-c60737cb5bb2
Mashanovich, G.Z.
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Gwilliam, R.
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Reed, G.T.
ca08dd60-c072-4d7d-b254-75714d570139

Wright, N.M., Thomson, D.J., Litvinenko, K.L., Headley, W.R., Smith, A.J., Knights, A.P., Deane, J.H.B., Gardes, F.Y., Mashanovich, G.Z., Gwilliam, R. and Reed, G.T. (2008) Free carrier lifetime modification for silicon waveguide based devices. Optics Express, 16 (24), 19779-19784. (doi:10.1364/OE.16.019779).

Record type: Article

Abstract

We investigate the effect of silicon ion irradiation on free carrier lifetime in silicon waveguides, and thus its ability to reduce the density of two-photon-absorption (TPA) generated free carriers. Our experimental results show that free carrier lifetime can be reduced significantly by silicon ion implantation. Associated excess optical absorption from the implanted ions can be reduced to an acceptable level if irradiation energy and dose are correctly chosen. Simulations of Raman scattering suggest that net gain can be achieved in certain cases without the need for an integrated diode in reverse bias to remove the photo-generated free carriers.

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Published date: 24 November 2008
Organisations: Optoelectronics Research Centre, Nanoelectronics and Nanotechnology, Photonic Systems Circuits & Sensors

Identifiers

Local EPrints ID: 356477
URI: http://eprints.soton.ac.uk/id/eprint/356477
ISSN: 1094-4087
PURE UUID: 2d025ffa-e6cc-4d68-bfe4-e5c9c3cf55ce
ORCID for F.Y. Gardes: ORCID iD orcid.org/0000-0003-1400-3272
ORCID for G.Z. Mashanovich: ORCID iD orcid.org/0000-0003-2954-5138

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Date deposited: 16 Sep 2013 13:52
Last modified: 29 Oct 2024 02:45

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Contributors

Author: N.M. Wright
Author: D.J. Thomson
Author: K.L. Litvinenko
Author: W.R. Headley
Author: A.J. Smith
Author: A.P. Knights
Author: J.H.B. Deane
Author: F.Y. Gardes ORCID iD
Author: G.Z. Mashanovich ORCID iD
Author: R. Gwilliam
Author: G.T. Reed

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