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Hot-wire Polysilicon Waveguides with Low Deposition Temperature

Hot-wire Polysilicon Waveguides with Low Deposition Temperature
Hot-wire Polysilicon Waveguides with Low Deposition Temperature
We fabricated and measured the optical loss of polysilicon waveguides deposited using Hot-Wire Chemical Vapour Deposition (HWCVD) at a temperature of 240°C. A polysilicon film 220 nm thick was deposited on top of a 2000 nm thick PECVD silicon dioxide. The crystalline volume fraction of the polysilicon film was measured by Raman spectroscopy to be 91%. The optical propagation losses of 400, 500, and 600 nm waveguides were measured to be 16.9, 15.9, and 13.5 dB/cm, respectively, for transverse electric (TE) mode at the wavelength of 1550 nm. Scattering loss is expected to be the major contributor to the propagation loss.
0146-9592
4030-4032
Ben Masaud, Taha
931dee8c-d8ac-4519-96ff-fa0813b4da59
Tarazona, Antulio
c6ae87c5-c746-4f89-9ff0-9e7b6874e94f
Jaberansary, Ehsan
579c745a-aef8-484c-9190-93c808552723
Chen, Xia
64f6ab92-ca11-4489-8c03-52bc986209ae
Reed, Graham T.
ca08dd60-c072-4d7d-b254-75714d570139
Mashanovich, Goran Z.
c806e262-af80-4836-b96f-319425060051
Chong, Harold M.H.
795aa67f-29e5-480f-b1bc-9bd5c0d558e1
Ben Masaud, Taha
931dee8c-d8ac-4519-96ff-fa0813b4da59
Tarazona, Antulio
c6ae87c5-c746-4f89-9ff0-9e7b6874e94f
Jaberansary, Ehsan
579c745a-aef8-484c-9190-93c808552723
Chen, Xia
64f6ab92-ca11-4489-8c03-52bc986209ae
Reed, Graham T.
ca08dd60-c072-4d7d-b254-75714d570139
Mashanovich, Goran Z.
c806e262-af80-4836-b96f-319425060051
Chong, Harold M.H.
795aa67f-29e5-480f-b1bc-9bd5c0d558e1

Ben Masaud, Taha, Tarazona, Antulio, Jaberansary, Ehsan, Chen, Xia, Reed, Graham T., Mashanovich, Goran Z. and Chong, Harold M.H. (2013) Hot-wire Polysilicon Waveguides with Low Deposition Temperature. Optics Letters, 38 (20), 4030-4032. (doi:10.1364/OL.38.004030).

Record type: Article

Abstract

We fabricated and measured the optical loss of polysilicon waveguides deposited using Hot-Wire Chemical Vapour Deposition (HWCVD) at a temperature of 240°C. A polysilicon film 220 nm thick was deposited on top of a 2000 nm thick PECVD silicon dioxide. The crystalline volume fraction of the polysilicon film was measured by Raman spectroscopy to be 91%. The optical propagation losses of 400, 500, and 600 nm waveguides were measured to be 16.9, 15.9, and 13.5 dB/cm, respectively, for transverse electric (TE) mode at the wavelength of 1550 nm. Scattering loss is expected to be the major contributor to the propagation loss.

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More information

Published date: 2013
Organisations: Optoelectronics Research Centre, Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 356964
URI: https://eprints.soton.ac.uk/id/eprint/356964
ISSN: 0146-9592
PURE UUID: 2000a513-4087-4f31-8bc6-b3c667b016bc
ORCID for Xia Chen: ORCID iD orcid.org/0000-0002-0994-5401
ORCID for Harold M.H. Chong: ORCID iD orcid.org/0000-0002-7110-5761

Catalogue record

Date deposited: 28 Sep 2013 17:43
Last modified: 06 Jun 2018 12:37

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