Helium ion beam milling and electron beam lithography to create sub-20nm sized domain wall magnetoresistance spin-valve
Helium ion beam milling and electron beam lithography to create sub-20nm sized domain wall magnetoresistance spin-valve
Wang, Yudong
c48bcc7c-4cb4-468c-af4e-d1e601222009
Boden, Stuart
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Bagnall, Darren
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Rutt, H.N.
e09fa327-0c01-467a-9898-4e7f0cd715fc
de Groot, C.H.
92cd2e02-fcc4-43da-8816-c86f966be90c
17 September 2012
Wang, Yudong
c48bcc7c-4cb4-468c-af4e-d1e601222009
Boden, Stuart
83976b65-e90f-42d1-9a01-fe9cfc571bf8
Bagnall, Darren
5d84abc8-77e5-43f7-97cb-e28533f25ef1
Rutt, H.N.
e09fa327-0c01-467a-9898-4e7f0cd715fc
de Groot, C.H.
92cd2e02-fcc4-43da-8816-c86f966be90c
Wang, Yudong, Boden, Stuart, Bagnall, Darren, Rutt, H.N. and de Groot, C.H.
(2012)
Helium ion beam milling and electron beam lithography to create sub-20nm sized domain wall magnetoresistance spin-valve.
38th International Micro & Nano Engineering Conference, Toulouse, France.
16 - 20 Sep 2012.
Record type:
Conference or Workshop Item
(Poster)
Text
Abstract_MNE20122.pdf
- Other
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Published date: 17 September 2012
Venue - Dates:
38th International Micro & Nano Engineering Conference, Toulouse, France, 2012-09-16 - 2012-09-20
Organisations:
Electronics & Computer Science
Identifiers
Local EPrints ID: 358371
URI: http://eprints.soton.ac.uk/id/eprint/358371
PURE UUID: 570099e1-75fc-4de4-a56e-db52a1db7fa8
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Date deposited: 16 Oct 2013 12:54
Last modified: 15 Mar 2024 03:21
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Contributors
Author:
Yudong Wang
Author:
Stuart Boden
Author:
Darren Bagnall
Author:
H.N. Rutt
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