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Easy to adapt electron beam proximity effect correction parameter calibration based on visual inspection of a “Best Dose Sensor”

Easy to adapt electron beam proximity effect correction parameter calibration based on visual inspection of a “Best Dose Sensor”
Easy to adapt electron beam proximity effect correction parameter calibration based on visual inspection of a “Best Dose Sensor”
The quality of e-beam proximity effect correction depends on the quality of the proximity effect model parameters, which are not accessible to direct measurement. Monte Carlo simulation is capable of determining the electron scattering coefficients, but does not include the process induced effects such as resist blur. Therefore, various experimental methods have been suggested (Stevensat et al. (1986) [1]; Rishton and Kern (1987) [2]; Hudek (2006) [3]). Most are either highly labor intensive due to a large required number of critical dimension measurements, or simple in the experimental evaluation, but limited in accuracy (Babin and Svintsov (1992) [4]), since resist effects interfere with the evaluation criterion.

This paper presents an easy to adapt experimental calibration method based on visual inspection of a “Best Dose Sensor”, and its application to calibrate long- and mid-range effects
0167-9317
2158-2162
Unal, Nezih
532cd0db-9d48-4b2c-b1f9-27c60b77ff8d
Charlton, Martin D.B.
e7d2781c-5bb5-4dad-902b-f2c0281988ad
Wang, Yudong
c48bcc7c-4cb4-468c-af4e-d1e601222009
Waizmann, Ulrike
d413649d-92a9-4666-8ead-8a89c518e83d
Reindl, Thomas
0452d16f-0617-4de6-98c2-436840240fa7
Hofmann, Ulrich
a59f98d2-c777-4e70-93c1-2ad4e8fb73e9
Unal, Nezih
532cd0db-9d48-4b2c-b1f9-27c60b77ff8d
Charlton, Martin D.B.
e7d2781c-5bb5-4dad-902b-f2c0281988ad
Wang, Yudong
c48bcc7c-4cb4-468c-af4e-d1e601222009
Waizmann, Ulrike
d413649d-92a9-4666-8ead-8a89c518e83d
Reindl, Thomas
0452d16f-0617-4de6-98c2-436840240fa7
Hofmann, Ulrich
a59f98d2-c777-4e70-93c1-2ad4e8fb73e9

Unal, Nezih, Charlton, Martin D.B., Wang, Yudong, Waizmann, Ulrike, Reindl, Thomas and Hofmann, Ulrich (2011) Easy to adapt electron beam proximity effect correction parameter calibration based on visual inspection of a “Best Dose Sensor”. Microelectronic Engineering, 88 (8), 2158-2162. (doi:10.1016/j.mee.2011.02.066).

Record type: Article

Abstract

The quality of e-beam proximity effect correction depends on the quality of the proximity effect model parameters, which are not accessible to direct measurement. Monte Carlo simulation is capable of determining the electron scattering coefficients, but does not include the process induced effects such as resist blur. Therefore, various experimental methods have been suggested (Stevensat et al. (1986) [1]; Rishton and Kern (1987) [2]; Hudek (2006) [3]). Most are either highly labor intensive due to a large required number of critical dimension measurements, or simple in the experimental evaluation, but limited in accuracy (Babin and Svintsov (1992) [4]), since resist effects interfere with the evaluation criterion.

This paper presents an easy to adapt experimental calibration method based on visual inspection of a “Best Dose Sensor”, and its application to calibrate long- and mid-range effects

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More information

Published date: 2011
Organisations: Electronics & Computer Science

Identifiers

Local EPrints ID: 358376
URI: http://eprints.soton.ac.uk/id/eprint/358376
ISSN: 0167-9317
PURE UUID: 1fe4c6da-9e58-4e70-8fe2-3d74a2bd5c28

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Date deposited: 04 Oct 2013 10:33
Last modified: 14 Mar 2024 15:04

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Contributors

Author: Nezih Unal
Author: Martin D.B. Charlton
Author: Yudong Wang
Author: Ulrike Waizmann
Author: Thomas Reindl
Author: Ulrich Hofmann

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