Controlling the nanostructure of bismuth telluride by selective chemical vapour deposition from a single source precursor
Controlling the nanostructure of bismuth telluride by selective chemical vapour deposition from a single source precursor
High quality, nanostructured Bi2Te3,with an unprecedented degree of positional and orientational control of the material form on the nanoscale, is readily obtained by low pressure chemical vapour deposition using a new molecular precursor. This system offers a convenient method that delivers key structural requirements necessary to improve the thermoelectric efficiency of Bi2Te3 and to develop the nascent field of topological insulators.
Thermoelectric
4865-4869
Benjamin, Sophie L.
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de Groot, C.H.
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Gurnani, Chitra
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Hector, Andrew L.
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Huang, Ruomeng
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Koukharenko, Elena
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Levason, William
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Reid, Gillian
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14 April 2014
Benjamin, Sophie L.
3efd7555-c2e0-4330-a289-681bd13700df
de Groot, C.H.
92cd2e02-fcc4-43da-8816-c86f966be90c
Gurnani, Chitra
18063024-d052-4fe3-8a79-fdecd227bc2c
Hector, Andrew L.
f19a8f31-b37f-4474-b32a-b7cf05b9f0e5
Huang, Ruomeng
c6187811-ef2f-4437-8333-595c0d6ac978
Koukharenko, Elena
b34ae878-2776-4088-8880-5b2bd4f33ec3
Levason, William
e7f6d7c7-643c-49f5-8b57-0ebbe1bb52cd
Reid, Gillian
37d35b11-40ce-48c5-a68e-f6ce04cd4037
Benjamin, Sophie L., de Groot, C.H., Gurnani, Chitra, Hector, Andrew L., Huang, Ruomeng, Koukharenko, Elena, Levason, William and Reid, Gillian
(2014)
Controlling the nanostructure of bismuth telluride by selective chemical vapour deposition from a single source precursor.
Journal of Materials Chemistry A, 2 (14), .
(doi:10.1039/c4ta00341a).
Abstract
High quality, nanostructured Bi2Te3,with an unprecedented degree of positional and orientational control of the material form on the nanoscale, is readily obtained by low pressure chemical vapour deposition using a new molecular precursor. This system offers a convenient method that delivers key structural requirements necessary to improve the thermoelectric efficiency of Bi2Te3 and to develop the nascent field of topological insulators.
Thermoelectric
Text
Benjamin2014-Controlling the Nanostructure of Bismuth Telluride by Selective Chemical Vapour Deposition from a Single Source Precursor.pdf
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More information
Accepted/In Press date: 12 February 2014
e-pub ahead of print date: 12 February 2014
Published date: 14 April 2014
Organisations:
Characterisation and Analytics, Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 363119
URI: http://eprints.soton.ac.uk/id/eprint/363119
ISSN: 2050-7488
PURE UUID: e1f32f23-5df1-4a9f-8711-2b20c5b21735
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Date deposited: 20 Mar 2014 14:44
Last modified: 15 Mar 2024 03:42
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Contributors
Author:
Sophie L. Benjamin
Author:
Chitra Gurnani
Author:
Ruomeng Huang
Author:
Elena Koukharenko
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