Rapid laser-based micro/nano-manufacturing using digital multimirror device technology
Rapid laser-based micro/nano-manufacturing using digital multimirror device technology
Single pulses from an ultrafast laser, in combination with a Texas Instrument’s digital multimirror device, have been used to spatially pattern complex structures via laser-ablation, with sub-micron-scale resolution. This flexible and novel manufacturing technique has the ability to pattern (via additive and subtractive fabrication) up to ~1cm2 regions with sub-micron resolution on the time scale of hours, hence finding applications in fields as diverse as metamaterials, telecommunications and semiconductor technologies.
There exists a wide range of techniques for the fabrication of micro-scale complex structures, including electron beam lithography, focused-ion beam milling, and direct laser. Whilst these techniques undoubtedly provide impressive resolution, these approaches are not so useful for the manufacturing of larger-scale (~1mm to 1cm) devices, due to the significant time scales that are generally required.
Mills, B.
05f1886e-96ef-420f-b856-4115f4ab36d0
Feinäugle, Matthias
3b15dc5b-ff52-4232-9632-b1be238a750c
Gholipour, B.
c17bd62d-9df6-40e6-bc42-65272d97e559
Grant-Jacob, James
c5d144d8-3c43-4195-8e80-edd96bfda91b
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020
Mills, B.
05f1886e-96ef-420f-b856-4115f4ab36d0
Feinäugle, Matthias
3b15dc5b-ff52-4232-9632-b1be238a750c
Gholipour, B.
c17bd62d-9df6-40e6-bc42-65272d97e559
Grant-Jacob, James
c5d144d8-3c43-4195-8e80-edd96bfda91b
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020
Mills, B., Feinäugle, Matthias, Gholipour, B., Grant-Jacob, James and Eason, R.W.
(2013)
Rapid laser-based micro/nano-manufacturing using digital multimirror device technology.
UKMTFC 2013 (2nd Annual EPSRC Manufacturing the Future Conference), Cranfield, United Kingdom.
16 - 17 Sep 2013.
Record type:
Conference or Workshop Item
(Paper)
Abstract
Single pulses from an ultrafast laser, in combination with a Texas Instrument’s digital multimirror device, have been used to spatially pattern complex structures via laser-ablation, with sub-micron-scale resolution. This flexible and novel manufacturing technique has the ability to pattern (via additive and subtractive fabrication) up to ~1cm2 regions with sub-micron resolution on the time scale of hours, hence finding applications in fields as diverse as metamaterials, telecommunications and semiconductor technologies.
There exists a wide range of techniques for the fabrication of micro-scale complex structures, including electron beam lithography, focused-ion beam milling, and direct laser. Whilst these techniques undoubtedly provide impressive resolution, these approaches are not so useful for the manufacturing of larger-scale (~1mm to 1cm) devices, due to the significant time scales that are generally required.
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e-pub ahead of print date: 2013
Venue - Dates:
UKMTFC 2013 (2nd Annual EPSRC Manufacturing the Future Conference), Cranfield, United Kingdom, 2013-09-16 - 2013-09-17
Organisations:
Optoelectronics Research Centre
Identifiers
Local EPrints ID: 365187
URI: http://eprints.soton.ac.uk/id/eprint/365187
PURE UUID: f1d89fb8-79c9-4994-bcc8-45fc05fc316d
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Date deposited: 27 May 2014 13:06
Last modified: 12 Dec 2021 03:36
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Contributors
Author:
B. Mills
Author:
Matthias Feinäugle
Author:
B. Gholipour
Author:
James Grant-Jacob
Author:
R.W. Eason
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