Kalhor, Nima, Boden, Stuart A. and Mizuta, Hiroshi (2014) Sub-10nm patterning by focused He-ion beam milling for fabrication of downscaled graphene nano devices. Microelectronic Engineering, 114, 70-77. (doi:10.1016/j.mee.2013.09.018).
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Accepted/In Press date: 28 September 2013
e-pub ahead of print date: 11 October 2013
Published date: February 2014
Organisations:
Electronics & Computer Science
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Local EPrints ID: 367875
URI: http://eprints.soton.ac.uk/id/eprint/367875
ISSN: 0167-9317
PURE UUID: 56518c91-b4c2-428c-8c50-f47a9f330b01
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Date deposited: 08 Aug 2014 13:29
Last modified: 15 Mar 2024 03:21
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Author:
Nima Kalhor
Author:
Stuart A. Boden
Author:
Hiroshi Mizuta
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