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Sub-10nm patterning by focused He-ion beam milling for fabrication of downscaled graphene nano devices

Sub-10nm patterning by focused He-ion beam milling for fabrication of downscaled graphene nano devices
Sub-10nm patterning by focused He-ion beam milling for fabrication of downscaled graphene nano devices
0167-9317
70-77
Kalhor, Nima
49a4f4e8-3b3e-444a-a8cd-860eb1b621c4
Boden, Stuart A.
83976b65-e90f-42d1-9a01-fe9cfc571bf8
Mizuta, Hiroshi
f14d5ffc-751b-472b-8dba-c8518c6840b9
Kalhor, Nima
49a4f4e8-3b3e-444a-a8cd-860eb1b621c4
Boden, Stuart A.
83976b65-e90f-42d1-9a01-fe9cfc571bf8
Mizuta, Hiroshi
f14d5ffc-751b-472b-8dba-c8518c6840b9

Kalhor, Nima, Boden, Stuart A. and Mizuta, Hiroshi (2014) Sub-10nm patterning by focused He-ion beam milling for fabrication of downscaled graphene nano devices. Microelectronic Engineering, 114, 70-77. (doi:10.1016/j.mee.2013.09.018).

Record type: Article
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Accepted/In Press date: 28 September 2013
e-pub ahead of print date: 11 October 2013
Published date: February 2014
Organisations: Electronics & Computer Science

Identifiers

Local EPrints ID: 367875
URI: https://eprints.soton.ac.uk/id/eprint/367875
ISSN: 0167-9317
PURE UUID: 56518c91-b4c2-428c-8c50-f47a9f330b01
ORCID for Stuart A. Boden: ORCID iD orcid.org/0000-0002-4232-1828

Catalogue record

Date deposited: 08 Aug 2014 13:29
Last modified: 07 Aug 2019 00:42

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Contributors

Author: Nima Kalhor
Author: Stuart A. Boden ORCID iD
Author: Hiroshi Mizuta

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