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Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials

Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials
Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials
We describe how plasma–wall interactions in etching plasmas lead to either random roughening/nanotexturing of polymeric and silicon surfaces, or formation of organized nanostructures on such surfaces. We conduct carefully designed experiments of plasma–wall interactions to understand the causes of both phenomena, and present Monte Carlo simulation results confirming the experiments. We discuss emerging applications in wetting and optical property control, protein immobilisation, microfluidics and lab-on-a-chip fabrication and modification, and cost-effective silicon mould fabrication. We conclude with an outlook on the plasma reactor future designs to take advantage of the observed phenomena for new micro- and nanomanufacturing processes, and new contributions to plasma nanoassembly.
0022-3727
174021-[13pp]
Gogolides, Evangelos
0f15ad96-305d-4ab9-9cc8-f397101bd1b9
Constantoudis, Vassilios
4d35166b-4d75-4caa-ae27-c991b51a01c3
Kokkoris, George
8a787445-2e0c-4a6c-b794-5d291ad58281
Kontziampasis, Dimitrios
30d5150b-113e-49e2-8682-d57254a23fab
Tsougeni, Katerina
7928c6cf-00ff-4dec-9d27-2a4d5f1344ae
Boulousis, George
78a53114-9fce-4011-8c26-68a14845911a
Vlachopoulou, Marilena
96ff9672-0c3a-4c97-aeee-e487c6fa56b0
Tserepi, Angeliki
229f7c36-7b8a-4eb8-8a33-208dba99a6d0
Gogolides, Evangelos
0f15ad96-305d-4ab9-9cc8-f397101bd1b9
Constantoudis, Vassilios
4d35166b-4d75-4caa-ae27-c991b51a01c3
Kokkoris, George
8a787445-2e0c-4a6c-b794-5d291ad58281
Kontziampasis, Dimitrios
30d5150b-113e-49e2-8682-d57254a23fab
Tsougeni, Katerina
7928c6cf-00ff-4dec-9d27-2a4d5f1344ae
Boulousis, George
78a53114-9fce-4011-8c26-68a14845911a
Vlachopoulou, Marilena
96ff9672-0c3a-4c97-aeee-e487c6fa56b0
Tserepi, Angeliki
229f7c36-7b8a-4eb8-8a33-208dba99a6d0

Gogolides, Evangelos, Constantoudis, Vassilios, Kokkoris, George, Kontziampasis, Dimitrios, Tsougeni, Katerina, Boulousis, George, Vlachopoulou, Marilena and Tserepi, Angeliki (2011) Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials. Journal of Physics D: Applied Physics, 44 (17), 174021-[13pp]. (doi:10.1088/0022-3727/44/17/174021).

Record type: Article

Abstract

We describe how plasma–wall interactions in etching plasmas lead to either random roughening/nanotexturing of polymeric and silicon surfaces, or formation of organized nanostructures on such surfaces. We conduct carefully designed experiments of plasma–wall interactions to understand the causes of both phenomena, and present Monte Carlo simulation results confirming the experiments. We discuss emerging applications in wetting and optical property control, protein immobilisation, microfluidics and lab-on-a-chip fabrication and modification, and cost-effective silicon mould fabrication. We conclude with an outlook on the plasma reactor future designs to take advantage of the observed phenomena for new micro- and nanomanufacturing processes, and new contributions to plasma nanoassembly.

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More information

Published date: 14 April 2011
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 368021
URI: https://eprints.soton.ac.uk/id/eprint/368021
ISSN: 0022-3727
PURE UUID: a1408ee8-569e-4b60-8714-da2aade83a53

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Date deposited: 09 Sep 2014 13:45
Last modified: 15 Jul 2019 21:47

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Contributors

Author: Evangelos Gogolides
Author: Vassilios Constantoudis
Author: George Kokkoris
Author: Dimitrios Kontziampasis
Author: Katerina Tsougeni
Author: George Boulousis
Author: Marilena Vlachopoulou
Author: Angeliki Tserepi

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