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Reactive Ion Etching on (Yb,Nb):RbTiOPO4/RbTiOPO4 epitaxial layers for the fabrication of Y-splitters and Mach-Zehnder Interferometers

Reactive Ion Etching on (Yb,Nb):RbTiOPO4/RbTiOPO4 epitaxial layers for the fabrication of Y-splitters and Mach-Zehnder Interferometers
Reactive Ion Etching on (Yb,Nb):RbTiOPO4/RbTiOPO4 epitaxial layers for the fabrication of Y-splitters and Mach-Zehnder Interferometers
Rubidium titanyl phosphate RbTiOPO4 (RTP) belongs to a highly diverse and versatile structural family and because of its large non-linear optical coefficients, wide transparency, high laser damage threshold, high chemical stability and low dielectric constants, this material is highly attractive for electro-optic applications such as modulators and Q-switches. RTP has a similar non-linear optical coefficient to KTP but, unlike KTP, it can be doped with Yb3+ ions to obtain a high enough concentration to allow efficient laser action. Because of all these interesting properties, RTP is a strong candidate as a platform material for integrated photonics. Reactive ion etching (RIE) is a commonly used method in etching of semiconductors, but there is little literature available on the plasma-based etching of RTP. Moreover, single-mode rib waveguides have been successfully fabricated in (Yb,Nb):RTP by RIE. In this work, (Yb,Nb):RbTiOPO4/RbTiOPO4 (001) epitaxial layers have been structured by RIE by using a combination of Ar and SF6 gases. The refractive index contrasts between the (Yb,Nb):RbTiOPO4 layer and the RbTiOPO4 substrate at 1.55 microns have been measured.
Butt, M.A.
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Solé, R.
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Pujol, M.C.
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Ródenas, A.
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Lifante, G.
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Choudhary, A.
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Murugan, G.S.
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Shepherd, D.P.
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Wilkinson, J.S.
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Aguiló, M.
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Díaz, F.
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Butt, M.A.
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Solé, R.
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Pujol, M.C.
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Ródenas, A.
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Lifante, G.
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Choudhary, A.
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Murugan, G.S.
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Shepherd, D.P.
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Wilkinson, J.S.
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Aguiló, M.
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Díaz, F.
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Butt, M.A., Solé, R., Pujol, M.C., Ródenas, A., Lifante, G., Choudhary, A., Murugan, G.S., Shepherd, D.P., Wilkinson, J.S., Aguiló, M. and Díaz, F. (2014) Reactive Ion Etching on (Yb,Nb):RbTiOPO4/RbTiOPO4 epitaxial layers for the fabrication of Y-splitters and Mach-Zehnder Interferometers. 8th French-Spanish meeting on Solid State Chemistry and Physics, Spain. 01 - 03 Apr 2014.

Record type: Conference or Workshop Item (Paper)

Abstract

Rubidium titanyl phosphate RbTiOPO4 (RTP) belongs to a highly diverse and versatile structural family and because of its large non-linear optical coefficients, wide transparency, high laser damage threshold, high chemical stability and low dielectric constants, this material is highly attractive for electro-optic applications such as modulators and Q-switches. RTP has a similar non-linear optical coefficient to KTP but, unlike KTP, it can be doped with Yb3+ ions to obtain a high enough concentration to allow efficient laser action. Because of all these interesting properties, RTP is a strong candidate as a platform material for integrated photonics. Reactive ion etching (RIE) is a commonly used method in etching of semiconductors, but there is little literature available on the plasma-based etching of RTP. Moreover, single-mode rib waveguides have been successfully fabricated in (Yb,Nb):RTP by RIE. In this work, (Yb,Nb):RbTiOPO4/RbTiOPO4 (001) epitaxial layers have been structured by RIE by using a combination of Ar and SF6 gases. The refractive index contrasts between the (Yb,Nb):RbTiOPO4 layer and the RbTiOPO4 substrate at 1.55 microns have been measured.

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e-pub ahead of print date: April 2014
Venue - Dates: 8th French-Spanish meeting on Solid State Chemistry and Physics, Spain, 2014-04-01 - 2014-04-03
Organisations: Optoelectronics Research Centre

Identifiers

Local EPrints ID: 368217
URI: http://eprints.soton.ac.uk/id/eprint/368217
PURE UUID: 0ed13daa-a0bf-4fab-8fb0-a80b4446c59c
ORCID for G.S. Murugan: ORCID iD orcid.org/0000-0002-2733-3273
ORCID for D.P. Shepherd: ORCID iD orcid.org/0000-0002-4561-8184
ORCID for J.S. Wilkinson: ORCID iD orcid.org/0000-0003-4712-1697

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Date deposited: 29 Aug 2014 14:13
Last modified: 18 Feb 2021 17:05

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