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Nanofabrication technologies: high-throughput for tomorrow's metadevices

Nanofabrication technologies: high-throughput for tomorrow's metadevices
Nanofabrication technologies: high-throughput for tomorrow's metadevices
Fabrication fundamentals
1. Serial versus parallel? Most are currently fabricated by serial writing….
2. Additive or subtractive?
3. Feature size required.
4. One-off demonstration (journal paper) or volume production (in the shops by next Christmas…)
5. What material?
6. Cost….(+ normalise to 150mm diameter wafer)
7. Time to fabricate
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020
Mills, B.
05f1886e-96ef-420f-b856-4115f4ab36d0
Feinäugle, M.
5b631cb4-197f-49db-ab27-352cad7ff656
Heath, D.
d53c269d-90d2-41e6-aa63-a03f8f014d21
Banks, D.P.
9bd095f0-76f8-4ae2-a9a3-29c7990bf70e
Sones, C.L.
9de9d8ee-d394-46a5-80b7-e341c0eed0a8
Grant-Jacob, J.
c5d144d8-3c43-4195-8e80-edd96bfda91b
Katis, I.N.
f92dfb8f-610d-4877-83f6-fd26a571df12
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020
Mills, B.
05f1886e-96ef-420f-b856-4115f4ab36d0
Feinäugle, M.
5b631cb4-197f-49db-ab27-352cad7ff656
Heath, D.
d53c269d-90d2-41e6-aa63-a03f8f014d21
Banks, D.P.
9bd095f0-76f8-4ae2-a9a3-29c7990bf70e
Sones, C.L.
9de9d8ee-d394-46a5-80b7-e341c0eed0a8
Grant-Jacob, J.
c5d144d8-3c43-4195-8e80-edd96bfda91b
Katis, I.N.
f92dfb8f-610d-4877-83f6-fd26a571df12

Eason, R.W., Mills, B., Feinäugle, M., Heath, D., Banks, D.P., Sones, C.L., Grant-Jacob, J. and Katis, I.N. (2014) Nanofabrication technologies: high-throughput for tomorrow's metadevices. Metamaterials retreat, Chamonix-Mont-Blanc, France. 17 - 21 Mar 2014.

Record type: Conference or Workshop Item (Paper)

Abstract

Fabrication fundamentals
1. Serial versus parallel? Most are currently fabricated by serial writing….
2. Additive or subtractive?
3. Feature size required.
4. One-off demonstration (journal paper) or volume production (in the shops by next Christmas…)
5. What material?
6. Cost….(+ normalise to 150mm diameter wafer)
7. Time to fabricate

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More information

e-pub ahead of print date: 2014
Venue - Dates: Metamaterials retreat, Chamonix-Mont-Blanc, France, 2014-03-17 - 2014-03-21
Organisations: Optoelectronics Research Centre

Identifiers

Local EPrints ID: 368749
URI: http://eprints.soton.ac.uk/id/eprint/368749
PURE UUID: 92065aeb-5d24-4712-885a-b71514ed18d6
ORCID for R.W. Eason: ORCID iD orcid.org/0000-0001-9704-2204
ORCID for B. Mills: ORCID iD orcid.org/0000-0002-1784-1012
ORCID for J. Grant-Jacob: ORCID iD orcid.org/0000-0002-4270-4247
ORCID for I.N. Katis: ORCID iD orcid.org/0000-0002-2016-557X

Catalogue record

Date deposited: 11 Sep 2014 12:38
Last modified: 18 Feb 2021 17:23

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