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Fabrication of y-splitters and Mach-Zehnder structures on (Yb,Nb):RbTiOPO4/RbTiOPO4 epitaxial layers by reactive ion etching

Fabrication of y-splitters and Mach-Zehnder structures on (Yb,Nb):RbTiOPO4/RbTiOPO4 epitaxial layers by reactive ion etching
Fabrication of y-splitters and Mach-Zehnder structures on (Yb,Nb):RbTiOPO4/RbTiOPO4 epitaxial layers by reactive ion etching
Reactive ion etching of RbTiOPO4 (001) substrates and (Yb,Nb):RbTiOPO4/RbTiOPO4 (001) epitaxial layers has been performed using fluorine chemistry. A maximum etch rate of 8.7 nm/min was obtained, and the deepest etch achieved was 3.5 µm. The (Yb,Nb)-doped epitaxial layers showed a slower etching rate when compared with undoped material. Liquid phase epitaxial growth of cladding layers has also been performed, resulting in a high-quality interface growth without appreciable defects. 9-mm-long Mach Zehnder interferometer (MZI) and 9-mm-long Y-splitter structures were designed and patterned in RbTiOPO4 substrates and (Yb,Nb):RbTiOPO4/RbTiOPO4 (001) epitaxial layers. The structures fabricated in RbTiOPO4 substrates were filled with laser active (Yb,Nb):RbTiOPO4 higher refractive index core material, and finally an RbTiOPO4 cladding was grown on the samples. The refractive index difference between the (Yb,Nb):RbTiOPO4 layer and the RbTiOPO4 substrate at 1.5 µm has been measured and optical waveguiding at this wavelength has been demonstrated.
integrated optical materials, rbtiopo4, reactive ion etching, optical waves
0733-8724
1863-1871
Butt, M.A.
8c9fbdb2-90f4-44c1-a31b-f8d1b79a3be5
Solé, R.
1a1a97ea-3cba-4fa4-b476-1bbbe7ebd9a9
Pujol, M.C.
0a9fb054-d26a-4651-a706-a4af1eb8212f
Ródenas, A.
9419beb4-1a3a-4fd0-a4b9-fc720fba4717
Lifante, G.
670804f7-384a-41b1-9bf1-6ec02b9b0d3f
Choudhary, A.
a5540b54-f153-43e4-a59a-e3ed9360904b
Murugan, G.S.
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Shepherd, D.P.
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Wilkinson, J.S.
73483cf3-d9f2-4688-9b09-1c84257884ca
Aguiló, M.
61fe554a-22ea-43db-9fd3-8d3209bf99ed
Díaz, F.
babe7378-e970-4195-beab-84f41b1694a4
Butt, M.A.
8c9fbdb2-90f4-44c1-a31b-f8d1b79a3be5
Solé, R.
1a1a97ea-3cba-4fa4-b476-1bbbe7ebd9a9
Pujol, M.C.
0a9fb054-d26a-4651-a706-a4af1eb8212f
Ródenas, A.
9419beb4-1a3a-4fd0-a4b9-fc720fba4717
Lifante, G.
670804f7-384a-41b1-9bf1-6ec02b9b0d3f
Choudhary, A.
a5540b54-f153-43e4-a59a-e3ed9360904b
Murugan, G.S.
a867686e-0535-46cc-ad85-c2342086b25b
Shepherd, D.P.
9fdd51c4-39d6-41b3-9021-4c033c2f4ead
Wilkinson, J.S.
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Aguiló, M.
61fe554a-22ea-43db-9fd3-8d3209bf99ed
Díaz, F.
babe7378-e970-4195-beab-84f41b1694a4

Butt, M.A., Solé, R., Pujol, M.C., Ródenas, A., Lifante, G., Choudhary, A., Murugan, G.S., Shepherd, D.P., Wilkinson, J.S., Aguiló, M. and Díaz, F. (2015) Fabrication of y-splitters and Mach-Zehnder structures on (Yb,Nb):RbTiOPO4/RbTiOPO4 epitaxial layers by reactive ion etching. IEEE Journal of Lightwave Technology, 33 (9), 1863-1871. (doi:10.1109/JLT.2014.2379091).

Record type: Article

Abstract

Reactive ion etching of RbTiOPO4 (001) substrates and (Yb,Nb):RbTiOPO4/RbTiOPO4 (001) epitaxial layers has been performed using fluorine chemistry. A maximum etch rate of 8.7 nm/min was obtained, and the deepest etch achieved was 3.5 µm. The (Yb,Nb)-doped epitaxial layers showed a slower etching rate when compared with undoped material. Liquid phase epitaxial growth of cladding layers has also been performed, resulting in a high-quality interface growth without appreciable defects. 9-mm-long Mach Zehnder interferometer (MZI) and 9-mm-long Y-splitter structures were designed and patterned in RbTiOPO4 substrates and (Yb,Nb):RbTiOPO4/RbTiOPO4 (001) epitaxial layers. The structures fabricated in RbTiOPO4 substrates were filled with laser active (Yb,Nb):RbTiOPO4 higher refractive index core material, and finally an RbTiOPO4 cladding was grown on the samples. The refractive index difference between the (Yb,Nb):RbTiOPO4 layer and the RbTiOPO4 substrate at 1.5 µm has been measured and optical waveguiding at this wavelength has been demonstrated.

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Accepted/In Press date: 9 December 2014
e-pub ahead of print date: 16 March 2015
Published date: 1 May 2015
Keywords: integrated optical materials, rbtiopo4, reactive ion etching, optical waves
Organisations: Optoelectronics Research Centre

Identifiers

Local EPrints ID: 375775
URI: https://eprints.soton.ac.uk/id/eprint/375775
ISSN: 0733-8724
PURE UUID: 9763ded5-50ba-41f7-8429-162cf9ee4de7
ORCID for G.S. Murugan: ORCID iD orcid.org/0000-0002-2733-3273
ORCID for D.P. Shepherd: ORCID iD orcid.org/0000-0002-4561-8184
ORCID for J.S. Wilkinson: ORCID iD orcid.org/0000-0003-4712-1697

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Date deposited: 14 Apr 2015 09:20
Last modified: 24 Sep 2019 01:00

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Contributors

Author: M.A. Butt
Author: R. Solé
Author: M.C. Pujol
Author: A. Ródenas
Author: G. Lifante
Author: A. Choudhary
Author: G.S. Murugan ORCID iD
Author: D.P. Shepherd ORCID iD
Author: J.S. Wilkinson ORCID iD
Author: M. Aguiló
Author: F. Díaz

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