Picosecond laser machining in the bulk of transparent dielectrics: critical comparison with fs-laser direct writing
Picosecond laser machining in the bulk of transparent dielectrics: critical comparison with fs-laser direct writing
Picosecond lasers for bulk machining of transparent dielectrics are assessed as an alternative to fs-lasers. Nanogratings and micro-channels by selective etching are demonstrated. Scattering and inhomogeneous etching are challenges yet to be solved.
Corbari, C.
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Champion, A.
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Gecevičius, M.
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Beresna, M.
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Lancry, M.
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Poumellec, B.
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Bellouard, Y.
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Kazansky, P.G.
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Corbari, C.
0d97e1c1-7a62-47c6-8f97-735f7946f93f
Champion, A.
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Gecevičius, M.
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Beresna, M.
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Lancry, M.
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Poumellec, B.
852a9506-af6c-4671-9e91-e2567fc17ab6
Bellouard, Y.
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Kazansky, P.G.
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Corbari, C., Champion, A., Gecevičius, M., Beresna, M., Lancry, M., Poumellec, B., Bellouard, Y. and Kazansky, P.G.
(2012)
Picosecond laser machining in the bulk of transparent dielectrics: critical comparison with fs-laser direct writing.
CLEO/QELS 2012, , San Jose, United States.
06 - 11 May 2012.
2 pp
.
Record type:
Conference or Workshop Item
(Paper)
Abstract
Picosecond lasers for bulk machining of transparent dielectrics are assessed as an alternative to fs-lasers. Nanogratings and micro-channels by selective etching are demonstrated. Scattering and inhomogeneous etching are challenges yet to be solved.
More information
e-pub ahead of print date: 2012
Additional Information:
ATu3L.2
Venue - Dates:
CLEO/QELS 2012, , San Jose, United States, 2012-05-06 - 2012-05-11
Organisations:
Optoelectronics Research Centre
Identifiers
Local EPrints ID: 376465
URI: http://eprints.soton.ac.uk/id/eprint/376465
PURE UUID: 2bce0707-b887-4b61-b1b4-ac861f9149c8
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Date deposited: 22 Apr 2015 14:12
Last modified: 14 Mar 2024 19:43
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Contributors
Author:
C. Corbari
Author:
A. Champion
Author:
M. Gecevičius
Author:
M. Beresna
Author:
M. Lancry
Author:
B. Poumellec
Author:
Y. Bellouard
Author:
P.G. Kazansky
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