Kontziampasis, D., Trantidou, T., Regoutz, A., Humphrey, E.J., Carta, D., Terracciano, C.M. and Prodromakis, T. (2015) Effects of Ar and O2 plasma etching on parylene C: topography versus surface chemistry. Plasma Processes and Polymers. (doi:10.1002/ppap.201500053). (In Press)
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Accepted/In Press date: 2015
Organisations:
Nanoelectronics and Nanotechnology
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Local EPrints ID: 377544
URI: http://eprints.soton.ac.uk/id/eprint/377544
ISSN: 1612-8850
PURE UUID: c21aba8e-ec94-4c6e-8670-85f6bf8bfe79
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Date deposited: 09 Jun 2015 10:35
Last modified: 14 Mar 2024 20:05
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Author:
D. Kontziampasis
Author:
T. Trantidou
Author:
A. Regoutz
Author:
E.J. Humphrey
Author:
D. Carta
Author:
C.M. Terracciano
Author:
T. Prodromakis
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