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Effects of Ar and O2 plasma etching on parylene C: topography versus surface chemistry

Effects of Ar and O2 plasma etching on parylene C: topography versus surface chemistry
Effects of Ar and O2 plasma etching on parylene C: topography versus surface chemistry
1612-8850
Kontziampasis, D.
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Trantidou, T.
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Regoutz, A.
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Humphrey, E.J.
d728a181-61c5-4b44-9783-e94c6c95a5c6
Carta, D.
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Terracciano, C.M.
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Prodromakis, T.
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Kontziampasis, D.
0bffea5c-c766-4f82-b153-e5c00ac3df33
Trantidou, T.
1a2705ad-366d-432b-be5f-523d1303930c
Regoutz, A.
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Humphrey, E.J.
d728a181-61c5-4b44-9783-e94c6c95a5c6
Carta, D.
120de978-2aaa-4b4d-bf5f-3625c503040d
Terracciano, C.M.
79bb2862-f4c4-42b1-929c-3043b5bc8794
Prodromakis, T.
d58c9c10-9d25-4d22-b155-06c8437acfbf

Kontziampasis, D., Trantidou, T., Regoutz, A., Humphrey, E.J., Carta, D., Terracciano, C.M. and Prodromakis, T. (2015) Effects of Ar and O2 plasma etching on parylene C: topography versus surface chemistry. Plasma Processes and Polymers. (doi:10.1002/ppap.201500053). (In Press)

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More information

Accepted/In Press date: 2015
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 377544
URI: http://eprints.soton.ac.uk/id/eprint/377544
ISSN: 1612-8850
PURE UUID: c21aba8e-ec94-4c6e-8670-85f6bf8bfe79
ORCID for T. Prodromakis: ORCID iD orcid.org/0000-0002-6267-6909

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Date deposited: 09 Jun 2015 10:35
Last modified: 14 Mar 2024 20:05

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Contributors

Author: D. Kontziampasis
Author: T. Trantidou
Author: A. Regoutz
Author: E.J. Humphrey
Author: D. Carta
Author: C.M. Terracciano
Author: T. Prodromakis ORCID iD

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