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Comparison of crack resistance between ternary CrSiC and quaternary CrSiCN coatings via nanoindentation

Comparison of crack resistance between ternary CrSiC and quaternary CrSiCN coatings via nanoindentation
Comparison of crack resistance between ternary CrSiC and quaternary CrSiCN coatings via nanoindentation
Quaternary CrSiCN and ternary CrSiC coatings with various Si concentrations were synthesized on Si(100) wafers via adjusting the flow of (CH3)3SiH (TMS) in precursor gases. The mechanical property and crack resistance of these coatings were evaluated and compared, as well as the influence of Si concentration was investigated. Compared with the CrSiC coatings, the CrSiCN coatings had higher elasticity and compressive stresses, and in turn, exhibited higher resistance to radial cracks in despite of the Si concentration. The greater thickness of CrSiCN coatings is, the better the crack resistance is. By increasing Si concentration, the compressive stress was released in both categories of coatings, but the trends of crack generation for the two categories of coatings were totally different. For the CrSiCN coatings, a reduction of compressive stress prevented parallel crack initiation around the impression edge after unloading. In contrast, as the compressive stress in the CrSiC coatings was released, radial cracks were generated at the impression corners and the length of radial crack increases with the stress release.
PVD coatings, nanoindentation, crack, residual stress, morphology
0921-5093
391-397
Wang, Qianzhi
696b2954-9bbe-4e19-a9d2-22435e55d9b4
Wu, Zhiwei
9c0029ce-c487-42bd-b1bb-2ecc13659a64
Zhou, Fei
aaf54725-aefa-4df9-a69c-07b3f60060fc
Yan, Jiwang
5941b300-5771-4494-9bd0-bb932725d894
Wang, Qianzhi
696b2954-9bbe-4e19-a9d2-22435e55d9b4
Wu, Zhiwei
9c0029ce-c487-42bd-b1bb-2ecc13659a64
Zhou, Fei
aaf54725-aefa-4df9-a69c-07b3f60060fc
Yan, Jiwang
5941b300-5771-4494-9bd0-bb932725d894

Wang, Qianzhi, Wu, Zhiwei, Zhou, Fei and Yan, Jiwang (2015) Comparison of crack resistance between ternary CrSiC and quaternary CrSiCN coatings via nanoindentation. Materials Science and Engineering: A, 642, 391-397. (doi:10.1016/j.msea.2015.07.024).

Record type: Article

Abstract

Quaternary CrSiCN and ternary CrSiC coatings with various Si concentrations were synthesized on Si(100) wafers via adjusting the flow of (CH3)3SiH (TMS) in precursor gases. The mechanical property and crack resistance of these coatings were evaluated and compared, as well as the influence of Si concentration was investigated. Compared with the CrSiC coatings, the CrSiCN coatings had higher elasticity and compressive stresses, and in turn, exhibited higher resistance to radial cracks in despite of the Si concentration. The greater thickness of CrSiCN coatings is, the better the crack resistance is. By increasing Si concentration, the compressive stress was released in both categories of coatings, but the trends of crack generation for the two categories of coatings were totally different. For the CrSiCN coatings, a reduction of compressive stress prevented parallel crack initiation around the impression edge after unloading. In contrast, as the compressive stress in the CrSiC coatings was released, radial cracks were generated at the impression corners and the length of radial crack increases with the stress release.

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More information

Accepted/In Press date: 9 July 2015
e-pub ahead of print date: 10 July 2015
Published date: 26 August 2015
Keywords: PVD coatings, nanoindentation, crack, residual stress, morphology
Organisations: nCATS Group

Identifiers

Local EPrints ID: 379548
URI: http://eprints.soton.ac.uk/id/eprint/379548
ISSN: 0921-5093
PURE UUID: 21aa4284-83f8-4923-bef3-d1cc556b493b

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Date deposited: 05 Aug 2015 14:18
Last modified: 14 Mar 2024 20:43

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Contributors

Author: Qianzhi Wang
Author: Zhiwei Wu
Author: Fei Zhou
Author: Jiwang Yan

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