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Evaluation of neodymium doped fluoride glass films deposited by pulsed laser deposition

Evaluation of neodymium doped fluoride glass films deposited by pulsed laser deposition
Evaluation of neodymium doped fluoride glass films deposited by pulsed laser deposition
Pulsed laser deposition (PLD) has been evaluated as a technique for the realisation of neodymium doped fluoride glass waveguides. In contrast to other high energy techniques such as sputtering and molecular beam epitaxy, pulsed laser deposition appears to reliably reproduce the bulk stoichiometry of the doped glass in thin film form. However, characteristically for this deposition technique, the film topography is dominated by micron size particulates generated during fabrication. Film uniformity appears to be improved by depositing the film with a laser beam fluence close to the ablation threshold of the material. Unfortunately, this is at the cost of a significantly reduced film thickness which ultimately limits the usefulness of PLD for depositing waveguides from this material.

Ultraviolet Laser Facility, Crete
Harwood, D.W.J.
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Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020
Taylor, E.R.
d9a73a87-6abd-4a1e-a462-84549c667d19
Harwood, D.W.J.
1103aa43-a21d-41a1-aa9c-d180fb4ef95d
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020
Taylor, E.R.
d9a73a87-6abd-4a1e-a462-84549c667d19

Harwood, D.W.J., Eason, R.W. and Taylor, E.R. (1997) Evaluation of neodymium doped fluoride glass films deposited by pulsed laser deposition Ultraviolet Laser Facility, Crete 22pp.

Record type: Monograph (Project Report)

Abstract

Pulsed laser deposition (PLD) has been evaluated as a technique for the realisation of neodymium doped fluoride glass waveguides. In contrast to other high energy techniques such as sputtering and molecular beam epitaxy, pulsed laser deposition appears to reliably reproduce the bulk stoichiometry of the doped glass in thin film form. However, characteristically for this deposition technique, the film topography is dominated by micron size particulates generated during fabrication. Film uniformity appears to be improved by depositing the film with a laser beam fluence close to the ablation threshold of the material. Unfortunately, this is at the cost of a significantly reduced film thickness which ultimately limits the usefulness of PLD for depositing waveguides from this material.

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Published date: 1997

Identifiers

Local EPrints ID: 380202
URI: https://eprints.soton.ac.uk/id/eprint/380202
PURE UUID: c81fc1ce-cda9-44a6-a7c2-e3515bab7782
ORCID for R.W. Eason: ORCID iD orcid.org/0000-0001-9704-2204

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Date deposited: 05 Feb 2016 09:46
Last modified: 06 Jun 2018 13:13

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