(2015) Helium ion beam lithography on fullerene molecular resists for sub-10 nm patterning. 41st International Conference on Micro and Nano Engineering (MNE 2015), Netherlands. 21 - 24 Sep 2015. 1 pp . (In Press)
Record type:
Conference or Workshop Item
(Poster)
More information
Accepted/In Press date: 24 July 2015
Venue - Dates:
41st International Conference on Micro and Nano Engineering (MNE 2015), Netherlands, 2015-09-21 - 2015-09-24
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 380511
URI: http://eprints.soton.ac.uk/id/eprint/380511
PURE UUID: 273bd772-4fee-47ae-ae88-03e3a34235f5
Catalogue record
Date deposited: 11 Sep 2015 11:02
Last modified: 06 Jun 2018 12:43
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Contributors
Author:
Xiaoqing Shi
Author:
Philip Prewett
Author:
Ejaz Huq
Author:
Darren M. Bagnall
Author:
Alex P.G. Robinson
Author:
Stuart A. Boden
University divisions
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