Helium ion beam lithography on fullerene molecular resists for sub-10 nm patterning

Shi, Xiaoqing, Prewett, Philip, Huq, Ejaz, Bagnall, Darren M., Robinson, Alex P.G. and Boden, Stuart A. (2015) Helium ion beam lithography on fullerene molecular resists for sub-10 nm patterning. 41st International Conference on Micro and Nano Engineering (MNE 2015), Netherlands. 21 - 24 Sep 2015. 1 pp . (In Press)

Record type: Conference or Workshop Item (Poster)

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X.ShiAbstract_C60_MNE2015_3-Accepted.pdf - Accepted Manuscript

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Accepted/In Press date: 24 July 2015

Venue - Dates: 41st International Conference on Micro and Nano Engineering (MNE 2015), Netherlands, 2015-09-21 - 2015-09-24

Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 380511

URI: https://eprints.soton.ac.uk/id/eprint/380511

PURE UUID: 273bd772-4fee-47ae-ae88-03e3a34235f5

ORCID for Stuart A. Boden:

orcid.org/0000-0002-4232-1828

Catalogue record

Date deposited: 11 Sep 2015 11:02

Last modified: 06 Jun 2018 12:43

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Contributors

Author: Xiaoqing Shi

Author: Philip Prewett

Author: Ejaz Huq

Author: Darren M. Bagnall

Author: Alex P.G. Robinson

Author: Stuart A. Boden

University divisions

Faculties (pre 2018 reorg) > Faculty of Physical Sciences and Engineering (pre 2018 reorg) > Electronics & Computer Science (pre 2018 reorg) > Nanoelectronics and Nanotechnology (pre 2018 reorg)
Current Faculties > Faculty of Engineering and Physical Sciences > School of Electronics and Computer Science > Electronics & Computer Science (pre 2018 reorg) > Nanoelectronics and Nanotechnology (pre 2018 reorg)
School of Electronics and Computer Science > Electronics & Computer Science (pre 2018 reorg) > Nanoelectronics and Nanotechnology (pre 2018 reorg)

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