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Helium ion beam lithography on fullerene molecular resists for sub-10 nm patterning

Helium ion beam lithography on fullerene molecular resists for sub-10 nm patterning
Helium ion beam lithography on fullerene molecular resists for sub-10 nm patterning
Shi, Xiaoqing
004139e0-0381-40c5-a407-ea9865fd3c7a
Prewett, Philip
6a3a966f-5dd0-43d0-8a51-6a5f78e56b1a
Huq, Ejaz
6ba52b03-395d-4361-96b0-5f0d9d7eb746
Bagnall, Darren M.
5d84abc8-77e5-43f7-97cb-e28533f25ef1
Robinson, Alex P.G.
4d2e378b-8882-406d-a2c4-f4c050af4027
Boden, Stuart A.
83976b65-e90f-42d1-9a01-fe9cfc571bf8
Shi, Xiaoqing
004139e0-0381-40c5-a407-ea9865fd3c7a
Prewett, Philip
6a3a966f-5dd0-43d0-8a51-6a5f78e56b1a
Huq, Ejaz
6ba52b03-395d-4361-96b0-5f0d9d7eb746
Bagnall, Darren M.
5d84abc8-77e5-43f7-97cb-e28533f25ef1
Robinson, Alex P.G.
4d2e378b-8882-406d-a2c4-f4c050af4027
Boden, Stuart A.
83976b65-e90f-42d1-9a01-fe9cfc571bf8

Shi, Xiaoqing, Prewett, Philip, Huq, Ejaz, Bagnall, Darren M., Robinson, Alex P.G. and Boden, Stuart A. (2015) Helium ion beam lithography on fullerene molecular resists for sub-10 nm patterning. 41st International Conference on Micro and Nano Engineering (MNE 2015), Netherlands. 21 - 24 Sep 2015. 1 pp . (In Press)

Record type: Conference or Workshop Item (Poster)
Text
X.ShiAbstract_C60_MNE2015_3-Accepted.pdf - Accepted Manuscript
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More information

Accepted/In Press date: 24 July 2015
Venue - Dates: 41st International Conference on Micro and Nano Engineering (MNE 2015), Netherlands, 2015-09-21 - 2015-09-24
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 380511
URI: https://eprints.soton.ac.uk/id/eprint/380511
PURE UUID: 273bd772-4fee-47ae-ae88-03e3a34235f5
ORCID for Stuart A. Boden: ORCID iD orcid.org/0000-0002-4232-1828

Catalogue record

Date deposited: 11 Sep 2015 11:02
Last modified: 06 Jun 2018 12:43

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