Helium ion beam lithography on fullerene molecular resists for sub-10 nm patterning
Helium ion beam lithography on fullerene molecular resists for sub-10 nm patterning
Shi, Xiaoqing
004139e0-0381-40c5-a407-ea9865fd3c7a
Prewett, Philip
6a3a966f-5dd0-43d0-8a51-6a5f78e56b1a
Huq, Ejaz
6ba52b03-395d-4361-96b0-5f0d9d7eb746
Bagnall, Darren M.
5d84abc8-77e5-43f7-97cb-e28533f25ef1
Robinson, Alex P.G.
4d2e378b-8882-406d-a2c4-f4c050af4027
Boden, Stuart A.
83976b65-e90f-42d1-9a01-fe9cfc571bf8
Shi, Xiaoqing
004139e0-0381-40c5-a407-ea9865fd3c7a
Prewett, Philip
6a3a966f-5dd0-43d0-8a51-6a5f78e56b1a
Huq, Ejaz
6ba52b03-395d-4361-96b0-5f0d9d7eb746
Bagnall, Darren M.
5d84abc8-77e5-43f7-97cb-e28533f25ef1
Robinson, Alex P.G.
4d2e378b-8882-406d-a2c4-f4c050af4027
Boden, Stuart A.
83976b65-e90f-42d1-9a01-fe9cfc571bf8
(2015)
Helium ion beam lithography on fullerene molecular resists for sub-10 nm patterning.
41st International Conference on Micro and Nano Engineering (MNE 2015), Netherlands.
21 - 24 Sep 2015.
1 pp
.
(In Press)
Record type:
Conference or Workshop Item
(Poster)
Text
X.ShiAbstract_C60_MNE2015_3-Accepted.pdf
- Accepted Manuscript
More information
Accepted/In Press date: 24 July 2015
Venue - Dates:
41st International Conference on Micro and Nano Engineering (MNE 2015), Netherlands, 2015-09-21 - 2015-09-24
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 380511
URI: http://eprints.soton.ac.uk/id/eprint/380511
PURE UUID: 273bd772-4fee-47ae-ae88-03e3a34235f5
Catalogue record
Date deposited: 11 Sep 2015 11:02
Last modified: 06 Jun 2018 12:43
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Contributors
Author:
Xiaoqing Shi
Author:
Philip Prewett
Author:
Ejaz Huq
Author:
Darren M. Bagnall
Author:
Alex P.G. Robinson
Author:
Stuart A. Boden
University divisions
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