Shi, Xiaoqing, Prewett, Philip, Huq, Ejaz, Bagnall, Darren M. and Boden, Stuart A. (2015) Proximity effect quantification and dose optimisation for high resolution helium ion beam lithography. 41st International Conference on Micro and Nano Engineering (MNE 2015), , Den Haag, Netherlands. 21 - 24 Sep 2015. 1 pp . (In Press)
Record type:
Conference or Workshop Item
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Accepted/In Press date: 24 July 2015
Venue - Dates:
41st International Conference on Micro and Nano Engineering (MNE 2015), , Den Haag, Netherlands, 2015-09-21 - 2015-09-24
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 380513
URI: http://eprints.soton.ac.uk/id/eprint/380513
PURE UUID: 6d904d6d-bc5d-4077-b53e-d716ec0c4753
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Date deposited: 11 Sep 2015 11:16
Last modified: 15 Mar 2024 03:21
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Contributors
Author:
Xiaoqing Shi
Author:
Philip Prewett
Author:
Ejaz Huq
Author:
Darren M. Bagnall
Author:
Stuart A. Boden
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