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Proximity effect quantification and dose optimisation for high resolution helium ion beam lithography

Proximity effect quantification and dose optimisation for high resolution helium ion beam lithography
Proximity effect quantification and dose optimisation for high resolution helium ion beam lithography
Shi, Xiaoqing
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Prewett, Philip
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Huq, Ejaz
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Bagnall, Darren M.
5d84abc8-77e5-43f7-97cb-e28533f25ef1
Boden, Stuart A.
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Shi, Xiaoqing
004139e0-0381-40c5-a407-ea9865fd3c7a
Prewett, Philip
6a3a966f-5dd0-43d0-8a51-6a5f78e56b1a
Huq, Ejaz
6ba52b03-395d-4361-96b0-5f0d9d7eb746
Bagnall, Darren M.
5d84abc8-77e5-43f7-97cb-e28533f25ef1
Boden, Stuart A.
83976b65-e90f-42d1-9a01-fe9cfc571bf8

Shi, Xiaoqing, Prewett, Philip, Huq, Ejaz, Bagnall, Darren M. and Boden, Stuart A. (2015) Proximity effect quantification and dose optimisation for high resolution helium ion beam lithography. 41st International Conference on Micro and Nano Engineering (MNE 2015), , Den Haag, Netherlands. 21 - 24 Sep 2015. 1 pp . (In Press)

Record type: Conference or Workshop Item (Other)
Text
X.ShiAbstract_PMMA_MNE2015_3-Accepted.pdf - Accepted Manuscript
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More information

Accepted/In Press date: 24 July 2015
Venue - Dates: 41st International Conference on Micro and Nano Engineering (MNE 2015), , Den Haag, Netherlands, 2015-09-21 - 2015-09-24
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 380513
URI: http://eprints.soton.ac.uk/id/eprint/380513
PURE UUID: 6d904d6d-bc5d-4077-b53e-d716ec0c4753
ORCID for Stuart A. Boden: ORCID iD orcid.org/0000-0002-4232-1828

Catalogue record

Date deposited: 11 Sep 2015 11:16
Last modified: 15 Mar 2024 03:21

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Contributors

Author: Xiaoqing Shi
Author: Philip Prewett
Author: Ejaz Huq
Author: Darren M. Bagnall
Author: Stuart A. Boden ORCID iD

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