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Role of stress in the chemical etching of fused silica exposed to low-energy femtosecond laser pulses

Role of stress in the chemical etching of fused silica exposed to low-energy femtosecond laser pulses
Role of stress in the chemical etching of fused silica exposed to low-energy femtosecond laser pulses
Recently, it was demonstrated that femtosecond lasers pulses with energies below the ablation threshold locally enhance the etching rate of fused silica: regions that are exposed to the laser beam are etched faster. This remarkable property has been used for fabricating a variety of micro-structures like fluidic channels, tunnels or more complex devices, like mechanical flexures. The physical effect causing the etching-rate local enhancement is still debated and various hypotheses have been proposed among which localized densification models seem to prevail. In that context, we recently demonstrated that the amount of deposited energy plays a very important role. It was found that for laser repetition rates where no cumulative effects are observed, there exists an optimal amount of energy deposited to achieve the fastest etching rate. These observations suggest that the stress introduced during laser exposure plays an important role in the processing of fused silica with low energy ultrafast pulses. In this paper, we investigate the stress distributions in various laser patterns and how this stress distribution can account for various effects observed during processing such as a local etching enhancement, the occurrence of cracks in dense patterns made of multiple lines and finally, the presence of stress-induced birefringence.
Champion, Audrey
9fec2056-0d5f-4c51-b402-732ffc8204c6
Bellouard, Yves
50467062-29d4-4f06-a65c-7ef44d183550
Gecevičius, Mindaugas
271576ee-dd9d-40b3-ab2f-19686b91dc64
Beresna, Martynas
a6dc062e-93c6-46a5-aeb3-8de332cdec7b
Champion, Audrey
9fec2056-0d5f-4c51-b402-732ffc8204c6
Bellouard, Yves
50467062-29d4-4f06-a65c-7ef44d183550
Gecevičius, Mindaugas
271576ee-dd9d-40b3-ab2f-19686b91dc64
Beresna, Martynas
a6dc062e-93c6-46a5-aeb3-8de332cdec7b

Champion, Audrey, Bellouard, Yves, Gecevičius, Mindaugas and Beresna, Martynas (2011) Role of stress in the chemical etching of fused silica exposed to low-energy femtosecond laser pulses. Frontiers in Ultrafast Optics, Biomedical, Scientific and Industrial Applications, United States. 23 - 26 Jan 2011. 9 pp . (doi:10.1117/12.886307).

Record type: Conference or Workshop Item (Paper)

Abstract

Recently, it was demonstrated that femtosecond lasers pulses with energies below the ablation threshold locally enhance the etching rate of fused silica: regions that are exposed to the laser beam are etched faster. This remarkable property has been used for fabricating a variety of micro-structures like fluidic channels, tunnels or more complex devices, like mechanical flexures. The physical effect causing the etching-rate local enhancement is still debated and various hypotheses have been proposed among which localized densification models seem to prevail. In that context, we recently demonstrated that the amount of deposited energy plays a very important role. It was found that for laser repetition rates where no cumulative effects are observed, there exists an optimal amount of energy deposited to achieve the fastest etching rate. These observations suggest that the stress introduced during laser exposure plays an important role in the processing of fused silica with low energy ultrafast pulses. In this paper, we investigate the stress distributions in various laser patterns and how this stress distribution can account for various effects observed during processing such as a local etching enhancement, the occurrence of cracks in dense patterns made of multiple lines and finally, the presence of stress-induced birefringence.

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More information

Published date: January 2011
Venue - Dates: Frontiers in Ultrafast Optics, Biomedical, Scientific and Industrial Applications, United States, 2011-01-23 - 2011-01-26
Organisations: Optoelectronics Research Centre

Identifiers

Local EPrints ID: 380804
URI: https://eprints.soton.ac.uk/id/eprint/380804
PURE UUID: 1973b637-1c53-4912-90a7-76d9020dcc5e

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Date deposited: 07 Sep 2015 10:40
Last modified: 20 Sep 2017 16:32

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Contributors

Author: Audrey Champion
Author: Yves Bellouard
Author: Mindaugas Gecevičius

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